2005
DOI: 10.1016/j.mee.2005.07.045
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Influence of Al on the growth of NiSi2 on Si(001)

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Cited by 10 publications
(7 citation statements)
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“…2b). The presence of the polycrystalline NiSi 0.5 Al 0.5 film was proved by electron diffraction analysis elsewhere [19]. The similar sample structure was observed for Al contents ranging from z = 0.2 to z = 0.35.…”
Section: Resultssupporting
confidence: 55%
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“…2b). The presence of the polycrystalline NiSi 0.5 Al 0.5 film was proved by electron diffraction analysis elsewhere [19]. The similar sample structure was observed for Al contents ranging from z = 0.2 to z = 0.35.…”
Section: Resultssupporting
confidence: 55%
“…We reported for the first time on the structure of thin NiSi 2-x Al x and NiSi 2-x Ga x layers on Si(001) [19,20]. In this study we summarize the observed results and discuss the formation of silicide phases, their structure and chemical composition in Ni-Al-Si and Ni-Ga-Si thin film systems.…”
Section: Introductionmentioning
confidence: 75%
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“…In our previous study we reported on the structure of NiSi 2-x Al x layers on Si(001), which were obtained by solid phase reaction (SPR) [10]. It was shown, that addition of Al leads to the formation of closed NiSi 2 layers.…”
mentioning
confidence: 99%
“…Up to now there are only a few studies on the growth of the Ni-Al-Si films on Si [8,9], whereas there are no investigations of the Ni-Ga-Si thin film system. In our previous study we reported on the structure of NiSi 2-x Al x layers on Si(001), which were obtained by solid phase reaction (SPR) [10]. It was shown, that addition of Al leads to the formation of closed NiSi 2 layers.…”
mentioning
confidence: 99%