2013
DOI: 10.12785/ijtfst/020301
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Influence of annealing and thickness on the electrical properties of invar36 thin film for strain gauge applications

Abstract: Invar36 thin films with various thicknesses from 200Åto 1400Åare deposited on glass substrates by DC magnetron sputtering technique. After deposition, the samples are annealed in vacuum ambient (10 −5 mbar) upto 500 • C. Electrical properties of as-deposited as well as annealed films are analyzed with respect to thickness and annealing temperature. In situ measurement of sheet resistance of films with respect to annealing temperature is carried out by four probe technique. There is a decrease of sheet resistan… Show more

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Cited by 14 publications
(8 citation statements)
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“…35 As reported before, annealing for a long time at low temperature or high temperature for a short time may release a large amount of residue strains generated during the sputtering method. 36,37 By releasing this strain in the interface of the perovskite and NiO x layers, which is mostly posed to compressive strain at the low deposition pressure, 38 a good junction for charge transportation is potentially developed between perovskite and NiO x layers. Thus, in addition to good charge transport leading to high current density, a charge recombination drop occurs in the interface of the perovskite and NiO x layer and results in larger open circuit voltage.…”
Section: Resultsmentioning
confidence: 99%
“…35 As reported before, annealing for a long time at low temperature or high temperature for a short time may release a large amount of residue strains generated during the sputtering method. 36,37 By releasing this strain in the interface of the perovskite and NiO x layers, which is mostly posed to compressive strain at the low deposition pressure, 38 a good junction for charge transportation is potentially developed between perovskite and NiO x layers. Thus, in addition to good charge transport leading to high current density, a charge recombination drop occurs in the interface of the perovskite and NiO x layer and results in larger open circuit voltage.…”
Section: Resultsmentioning
confidence: 99%
“…Многочисленные авторы неоднократно рассматривали как теоретические аспекты, так и прак-тические возможности формирования наноостровковых покрытий посредством распада сплошных сверхтонких плeнок при термическом отжиге [3][4][5][6][9][10][11][12][13][14][15].…”
Section: теоретическая частьunclassified
“…A four-point bending setup is designed and fabricated in order to study the resistance-strain behavior of strain gauges and hence to measure the GF of the same [14]. A photograph of the GF measurement setup is shown in figure 4.…”
Section: Measurement Of the Gauge Factormentioning
confidence: 99%
“…Due to their low CTE and soft magnetic properties, these alloys are used in many industrial applications [12]. Invar36 alloy in thin film form is also gaining importance in sensors as well as in micro-electro-mechanical system applications [13][14][15].…”
Section: Introductionmentioning
confidence: 99%