2018
DOI: 10.1063/1.5032979
|View full text |Cite
|
Sign up to set email alerts
|

Influence of argon flow rate on structural and optical properties of TiO2 thin films deposited by RF sputtering

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2020
2020
2023
2023

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(2 citation statements)
references
References 18 publications
0
2
0
Order By: Relevance
“…[3,5] Unfortunately, the reduction of GO is generally accompanied by the stacking of graphene sheets, which results in a lower surface area than that desired for ideal graphene. [2,6] In this research, we investigated the reduction process while suppressing the stacking of graphene sheets using AA under mild reaction conditions. A series of investigations, such as GO/ AA ratio, reduction temperature, time-course analysis, and side product analysis, were performed to propose the mechanism of the reduction of GO.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…[3,5] Unfortunately, the reduction of GO is generally accompanied by the stacking of graphene sheets, which results in a lower surface area than that desired for ideal graphene. [2,6] In this research, we investigated the reduction process while suppressing the stacking of graphene sheets using AA under mild reaction conditions. A series of investigations, such as GO/ AA ratio, reduction temperature, time-course analysis, and side product analysis, were performed to propose the mechanism of the reduction of GO.…”
Section: Introductionmentioning
confidence: 99%
“…Each method has advantages: UV light allows the selective removal of epoxides; [1] and reducing agents work at relatively low temperatures [3,5] . Unfortunately, the reduction of GO is generally accompanied by the stacking of graphene sheets, which results in a lower surface area than that desired for ideal graphene [2,6] …”
Section: Introductionmentioning
confidence: 99%