“…FTIR analysis of the chemical and structural compositions of the silicon supports revealed a characteristic band of silicon at 730 cm –1 , which corresponds to the vibration modes of the Si–O bonds (Figure a). Moreover, a band at 1106 cm –1 , corresponding to the stretching vibrational modes of the Si–O bonds (both bands generated by the interaction of oxygen coming in the environment with crystalline silicon), and a band at 612 cm –1 , corresponding to the stretching vibrational modes of the Si–Si bonds (Figure a), were observed. ,, Regarding the functional groups generated on the surface by the reaction with APTMS, characteristic bands at 1024 and 1109 cm –1 were attributed to the vibrational modes of the Si–O–Si bonds; these bands corresponded to the formation of siloxane bonds between the silanol groups of APTMS and were generated due to the thermal oxidation process. − Bands attributed to the C–N bending vibrational modes at 1310 cm –1 , C–H stretching vibrational modes at 1380 cm –1 , and Si–C bending vibration modes at 1445 cm –1 were observed, as well as a band attributed to the amino group N–H stretching vibrational mode at 1584 cm –1 . ,, …”