2004
DOI: 10.1080/00202967.2004.11871582
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Influence of Chloride Ion in Acid Tin Methanesulphonate Electrolytes

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Cited by 3 publications
(4 citation statements)
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“…Various organic additives such as surface active agents like cetyl tetraalkyl ammonium bromide, aromatic carbonyl compounds, and amine-aldehyde reaction products, methane sulphonic acid and its derivatives, etc. [10][11][12] are used in plating solutions. Excess organic additives, higher current density and high metal ion concentration in the plating solution may have a bearing on solderability.…”
Section: Introductionmentioning
confidence: 99%
“…Various organic additives such as surface active agents like cetyl tetraalkyl ammonium bromide, aromatic carbonyl compounds, and amine-aldehyde reaction products, methane sulphonic acid and its derivatives, etc. [10][11][12] are used in plating solutions. Excess organic additives, higher current density and high metal ion concentration in the plating solution may have a bearing on solderability.…”
Section: Introductionmentioning
confidence: 99%
“…Being an acidic electrolyte it has the added benefit of being compatible with photoresist materials and therefore offers the possibility of being useful for microfabrication. Various researchers have reported on electrodeposition from MSA electrolytes for copper and tin [3,4] and their alloys [5][6][7][8][9][10][11].…”
Section: Introductionmentioning
confidence: 99%
“…Various additives or complexing agents such as brighteners, antioxidants, and surfactants have been shown to be required for Cu-Sn deposition [2,4,[5][6][7][8][9]. The simplest electrolyte has been shown to require an antioxidant and a fluorosurfactant [5,6].…”
Section: Introductionmentioning
confidence: 99%
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