Influence of Cl− ions on the photoelectrochemical behaviour of the Cu/H3PO4 system

The electrochenucal behavlour of Cu m different phosphate buffers IS studied through electrochemical techmques combmed wth scanning electron mwroscopy and energy dlsperslve X-ray analysis At pH 6 0 and 8 0 the onset of passwahon IS due to the anodlc formation of a basic Cu(II) phosphate, whereas at pH 11 5 the paswatmg layer corresponds to a duplex Cu(I) ox~e-Cu(II) ox& layer The potentiostatic ano&c current transients can be reproduced by a model mvolvmg the mlhal growth of a thm anodtc layer and the simultaneous electrodlssoluhon of Cu The electrodlssolutmn of pawvated Cu takes place through the paswatmg layer Thus reaction contnbutes to the thazkemng of the outer part of the pasavatmg layer

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Influence of Cl− ions on the photoelectrochemical behaviour of the Cu/H3PO4 system

Cited by 4 publications

References 4 publications

The characterisation of passive films on brass

The characterisation of passive films on brass

In situ spectro-electrochemical studies on the oxidation mechanism of brass

The formation of anodic layers on annealed copper surfaces in phosphate-containing solutions at different pH

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