Influence of Displacement Reaction on Electrodeposition of Noble Metal Particles on Silicon

Electrochemical Deposition of Pt Particles from Hexachloroplatinate(IV) and Tetrachloroplatinate(II) Ion Solutions

“…The particle density of the ca. 2 x 10 8 cm -2 (11) for the displacement deposition of Pt leads to high particle density of the electrodeposited Pt on n-Si and results in the high cathodic current density of n-Si electrode in the Pt(II) solution. The following result supports the ECS Transactions, 25 (33) 117-123 (2010) above explanation: the particle density of the Pt electrodeposited from the Pt(IV) solution (Fig.…”

“…Control of the fine interfacial structure between a semiconductor, metal particles, and the solution provides ideal semiconductor photoelectrodes (5,8,9). We have been investigating the electrodeposition of platinum (Pt), gold, and palladium nanoparticles on n-Si by a double potential step (DPS) method that applies a single pulse potential (first step) and maintains a constant potential (second step) (5,10,11). This method can control the particle density and the size of the deposited metals on n-Si with the pulse potential at the first step and the electricity that passed through the n-Si electrode at the second step, respectively.…”

“…This method can control the particle density and the size of the deposited metals on n-Si with the pulse potential at the first step and the electricity that passed through the n-Si electrode at the second step, respectively. We recently reported that a displacement reaction on the Si surface influenced the electrodeposition (10,11). The particle density of the electrodeposited Pt was different among the aqueous solutions of the hexachloroplatinate(IV) (PtCl 6 2-, hereafter Pt(IV)) and the tetrachloroplatinate(II) (PtCl 4 2-, hereafter Pt(II)).…”

Electrochemical Quartz Crystal Microbalance Study of the Electrodeposition of Platinum

“…Various studies of the electrochemical deposition of platinum have been reported [1][2][3][4][5][6][7]. We have been investigating the electrodeposition of platinum, gold, and palladium nanoparticles on n-type crystalline silicon substrates using a double potential step (DPS) method that involves the application of a single pulse potential (first step) and maintains a constant potential (second step) [8][9][10]. In this method, the particle density and size of the deposited metals can be controlled using the pulse potential during the first step and the electrical charges passed through the electrode during the second step, respectively.…”

“…In this method, the particle density and size of the deposited metals can be controlled using the pulse potential during the first step and the electrical charges passed through the electrode during the second step, respectively. The particle density of the electrodeposited Pt was different between the aqueous solutions of tetrachloroplatinate(II) (PtCl 4 2À , hereafter Pt(II)) and hexachloroplatinate(IV) (PtCl 6 2À , hereafter Pt(IV)) differs [10,11]. Pt(II) and Pt(IV) can undergo three types of reduction reactions as follows:…”