Influence of Elastic Properties of Thin Films deposited on Si and/or Mg substrates on Rayleigh velocity dispersion evolution

Touati, Ibtissem; Hadjoub, Z.; Touati-Tilba, L.; Doghmane, A.

doi:10.1016/j.phpro.2009.11.041

Cited by 1 publication

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“…For the lowest mode, called the Rayleigh mode, the dispersion curve starts at the Rayleigh velocity of the substrate, V RS , and as the product f h increases the velocity monotonically decreases to asymptotically approach the Rayleigh velocity appropriate to the layer material, V RL . Most reported investigations on loading effects are concerned with the behavior of the whole dispersion curve [4][5][6] with less theoretical and experimental work reported on the initial slope of decreasing regions [7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%

Application of negative velocity dispersion curves to the distinction between layer and substrate Rayleigh waves

Hadjoub

Touati

Doghmane

et al. 2008

Comptes Rendus. Physique

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This work concerns the investigation of loading layers/substrate structures in order to determine the critical thickness at which Rayleigh wave characteristics of layers can be completely distinguished from those of the substrates. To do so, we first calculate Rayleigh velocity dispersion curves of several thin film materials (about thirty) deposited on different slow and fast substrates (Be, Al 2 O 3 , AlN, Si, SiO 2 , Mg, SiC, TiN, WC and Pyrex). Then, from the beginning of curve saturation (corresponding to the onset of intrinsic layer characteristics) we deduced normalized thickness transition for all layers/substrates combinations. Thus, we were able to deduce an analytical linear expression relating the critical thickness to combined effects of densities and velocities of both layers and substrates. Such a simple relation can be used, as an alternative method, to predict the transition critical thickness for any layer/substrate combination without the usual lengthy calculation of dispersion curves.

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