2014
DOI: 10.12785/ijtfst/030207
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Influence of Energy Nitrogen Ion Implantation on Structural and Mechanical Properties of Chromium Thin Film

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Cited by 4 publications
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“…Both the ion and dislodged target atoms can continue and cause further damage, and so the energy is spread over many moving particles. Therefore, after implantation of high doses of ions an initially crystalline target will be so perturbed that it will have changed to a highly disordered state [14]. The amount of crystallographic damage can be enough to cause the partial amorphization of the metal surface, depending on the dose, energy, temperature (governing self-annealing that can occur to repair some or all of the damage as it is generated) and ion species (heavy ions displace a greater volume of target atoms per ion [15].…”
Section: Introductionmentioning
confidence: 99%
“…Both the ion and dislodged target atoms can continue and cause further damage, and so the energy is spread over many moving particles. Therefore, after implantation of high doses of ions an initially crystalline target will be so perturbed that it will have changed to a highly disordered state [14]. The amount of crystallographic damage can be enough to cause the partial amorphization of the metal surface, depending on the dose, energy, temperature (governing self-annealing that can occur to repair some or all of the damage as it is generated) and ion species (heavy ions displace a greater volume of target atoms per ion [15].…”
Section: Introductionmentioning
confidence: 99%