Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating

Abstract

In this paper, an exposure energy analysis method which affects the precision of incremental grating lithography is proposed. Based on the analysis of the charge and discharge circuit of high voltage pulsed xenon lamp power supply, the change the characteristics of charge and discharge voltage and current circuits is calculated and analyzed by using the Thevenin's basic theorem. The complete charge and discharge voltage, circuit and exposure energy of the pulsed xenon discharge circuit were quantitatively analyzed. The grating energy model and grating fringes were established by calculating the lithography threshold model. Through the example analysis, in order to reduce the influence on the lithography energy, the resistance value of the pulsed xenon lamp should be controlled within 1 Ω, and the error of the exposure time delay is controlled within 2 ms, which provides a theoretical basis for the lithography and control method of highprecision grating scale calculation.

Life prediction of lithium titanate batteries for high energy laser systems

“…As previously analyzed, the undetermined parameters in the performance degradation model are the drift coefficient 𝜇 and the diffusion coefficient 𝜎 2 . By treating both as random variables and knowing 𝜎 2 > 0, it can be deduced that 1/𝜎 2 > 0.…”

“…High-power laser systems, with advantages such as high beam quality, large energy, and strong stability, are widely used in applications like destruction, welding, and ablation [1][2]. Stable operation of high-power laser systems requires a power supply with high voltage stability, strong current output capability, and good temperature adaptability.…”