2019
DOI: 10.1016/j.tsf.2019.02.032
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Influence of growth conditions and film thickness on the anodization behavior of sputtered aluminum films and the fabrication of nanorod arrays

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Cited by 4 publications
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“…It has been reported that anodic porous alumina is formed on substrates by forming an Al film by sputtering or thermal evaporation and subsequent anodization in an acidic solution. [15][16][17][18][19][20] However, in most studies, the pore arrangement of the resulting anodic porous alumina was disordered. To fabricate anodic porous alumina with an ordered pore arrangement from the surface to the bottom, it is effective to form an ordered depression pattern on the surface of an Al substrate, which serves as the starting point for pore generation.…”
mentioning
confidence: 99%
“…It has been reported that anodic porous alumina is formed on substrates by forming an Al film by sputtering or thermal evaporation and subsequent anodization in an acidic solution. [15][16][17][18][19][20] However, in most studies, the pore arrangement of the resulting anodic porous alumina was disordered. To fabricate anodic porous alumina with an ordered pore arrangement from the surface to the bottom, it is effective to form an ordered depression pattern on the surface of an Al substrate, which serves as the starting point for pore generation.…”
mentioning
confidence: 99%