2010
DOI: 10.1109/tmag.2010.2045353
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Influence of Growth Field on NiFe, Fe$_3$O$_4$, and NiFe/Cr/Fe$_3$O$_4$ Spin-Valves

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Cited by 5 publications
(5 citation statements)
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“…The (111) orientation is specifically of interest because it is known to yield the largest exchange bias when using FeMn as the antiferromagnet [12]. Each sample shows without an applied growth field [13]. X-ray reflectivity was used to confirm that the deposition rate was independent of the magnetic field used during deposition.…”
Section: Resultsmentioning
confidence: 99%
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“…The (111) orientation is specifically of interest because it is known to yield the largest exchange bias when using FeMn as the antiferromagnet [12]. Each sample shows without an applied growth field [13]. X-ray reflectivity was used to confirm that the deposition rate was independent of the magnetic field used during deposition.…”
Section: Resultsmentioning
confidence: 99%
“…A custom substrate plate was used to deliver an in-plane field ∼250 Oe in a local region of the plate, while the opposite side of the plate has a field below the detection level of a calibrated Lakeshore 421 Gaussmeter. This allows two control samples of Cu(300 Å)/NiFeCuMo(200 Å)/Cu(300 Å) to be produced simultaneously, one with and one without an applied growth field [13]. X-ray reflectivity was used to confirm that the deposition rate was independent of the magnetic field used during deposition.…”
Section: Resultsmentioning
confidence: 99%
“…The Py and Py-Cu alloy layers were grown with RF sputtering with rates in the range 0.2–0.4 Å/s, depending on the target; IrMn and Ta were grown at 1.2 Å/s and 0.8 Å/s, respectively, using 100 W DC. All samples were grown in the presence of a small magnetic field on the substrate plate to induce exchange bias 14 . The Ta was used to prevent oxidation 15 .…”
Section: Fabrication and Methodsmentioning
confidence: 99%
“…The Py and Py-Cu alloy layers were grown with RF sputtering with rates in the range 0.2-0.4 Å/s, depending on the target; IrMn and Ta were grown at 1.2 Å/s and 0.8 Å/s, respectively, using 100 W DC. All samples were grown in the presence of a small magnetic field on the substrate plate to induce exchange bias [13]. The Ta was used to prevent oxidation [14].…”
Section: Fabrication and Methodsmentioning
confidence: 99%