2021
DOI: 10.1016/j.mtcomm.2021.102664
|View full text |Cite
|
Sign up to set email alerts
|

Influence of hydrogen plasma treatment on secondary phases in CZTS thin films for energy harvesting

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
6
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
8

Relationship

3
5

Authors

Journals

citations
Cited by 12 publications
(6 citation statements)
references
References 42 publications
0
6
0
Order By: Relevance
“… The compositional dependencies versus x for various phonon vibration modes of CZTSSe bulks and films are illustrated in Figure c,d; their corresponding shifts in the bands positions versus x have been given in Tables S2 and S3. Notably, all the Raman spectra do not demonstrate peaks of secondary phases, in which positions are indicated by the vertical lines in the lower plot in Figure a. , …”
Section: Results and Discussionmentioning
confidence: 93%
“… The compositional dependencies versus x for various phonon vibration modes of CZTSSe bulks and films are illustrated in Figure c,d; their corresponding shifts in the bands positions versus x have been given in Tables S2 and S3. Notably, all the Raman spectra do not demonstrate peaks of secondary phases, in which positions are indicated by the vertical lines in the lower plot in Figure a. , …”
Section: Results and Discussionmentioning
confidence: 93%
“…SEM and EDS measurements were carried out at 15 kV operating voltage. [94,95] To obtain the thickness of MoS 2 films and flakes with AFM, a Dimension 3100 by Bruker was used. [96] A NOVA2S spectrometer and Gora-light system (ideaoptics, Shanghai, China /ideaoptics.com/) were employed for Raman spectroscopy and mapping in the backscattering configuration with 532 nm excitation by Nd:YAG diode-pumped solid-state (DPSS) laser.…”
Section: Methodsmentioning
confidence: 99%
“…Oxygen can be used in processes requiring an oxidizing environment [42,43]. Hydrogen is often used in arc plasmotrons because of its ability to produce highly reactive plasma [44,45]. It is used in processes such as plasma cleaning, surface activation and chemical vapor deposition.…”
Section: Introductionmentioning
confidence: 99%