In this study, we describe the deposition of Hf and Mo metal layers individually on Ta to compose new buffer layers, ie, Ta/Hf and Ta/Mo, where CoFeB/MgO stacks are deposited using magnetron sputtering. The synthesised Ta/Hf buffer has higher surface roughness, while the Ta/Mo buffer has lower surface roughness as compared with the Ta buffer. The surface roughness of the buffer appears to influence the interface of the subsequently deposited layers, resulting in rougher or smoother CoFeB/MgO interfaces. Additionally, we present a report on the magnetic properties of Ta, Ta/Hf, and Ta/Mo buffer samples. As the annealing temperature is below 200°C, the saturation magnetisation (Ms) values for all buffer layers increase at similar rates, whereas the effective magnetic anisotropy energy (K eff ) values increase at varying rates. After annealing at 350°C, K eff reaches its maximum value for Ta/Hf and Ta/Mo buffer layers, whereas the CoFeB/MgO interface width decreases to a minimum value. The width increases as the annealing temperature is increased over 350°C, and K eff gradually decreases with increase in the annealing temperature. The CoFeB/MgO interface width is primarily dependent on the buffer/CoFeB interface width, which is a critical parameter to obtain high perpendicular magnetic anisotropy (PMA) and high-quality films. This work provides perspectives for understanding and controlling PMA from the viewpoint of interfacial structure. Subsequent studies found that the observed PMA in Ta/CoFeB/MgO sandwiches originates primarily from the CoFeB/MgO interface. 1,[4][5][6][7] More recently, the CoFeB/nonmagnetic metal counter interface has been reported to also affect the perpendicular anisotropy originating from CoFeB/MgO. [7][8][9][10][11][12] Typically, the thickness of CoFeB must be less than 1.5 nm in order to obtain a perpendicular easy axis. 1,8,12 Owing to the limitations on the required thickness, any influence of the counter interfaces of CoFeB with the buffer layer and MgO on the structural, morphological, and PMA properties of CoFeB layers warrants careful investigation.In the X-ray reflectivity (XRR) measurement conducted herein, we use Cu as the anode material and an X-ray wavelength of 0.154 nm to investigate the interface till submonolayer resolution in terms of roughness and/or intermixing. 13 XRR and atomic force microscopy (AFM) measurements were used to analyse changes in the interface structure during annealing.