2018
DOI: 10.1109/tns.2017.2760629
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Influence of LDD Spacers and H+Transport on the Total-Ionizing-Dose Response of 65-nm MOSFETs Irradiated to Ultrahigh Doses

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Cited by 87 publications
(39 citation statements)
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“…Both indicate that the longitudinal electric field has no big influence on the effects of TID on 28-nm bulk MOSFETs. This is different from what is observed for 65-nm bulk MOSFETs from the same foundry [10]. Especially, short-channel MOSFETs fabricated with this 65-nm bulk CMOS technology demonstrate a lower drain current when swapping drain and source.…”
Section: Irradiation and Stress Tests On Transfercontrasting
confidence: 90%
“…Both indicate that the longitudinal electric field has no big influence on the effects of TID on 28-nm bulk MOSFETs. This is different from what is observed for 65-nm bulk MOSFETs from the same foundry [10]. Especially, short-channel MOSFETs fabricated with this 65-nm bulk CMOS technology demonstrate a lower drain current when swapping drain and source.…”
Section: Irradiation and Stress Tests On Transfercontrasting
confidence: 90%
“…However, a brief comparison of the same size of transistors on different chips demonstrates the repeatability of our measurement results. Enclosed-layout transistors are often used for isolating the effects of TID on STI oxides [7], [8]. However, the strict design rules of this commercial 28-nm bulk CMOS process exclude such special structures.…”
Section: Methodsmentioning
confidence: 99%
“…Under the flatband condition, Ψ s and Q m equal to zero. Combining (8) and (9) and following the steps from (3.40) to (3.48) in [32] with the redefined parameters, we obtain the charge-voltage relation:…”
Section: B Utilization Of the Simplified Ekv Mosfet Modelmentioning
confidence: 99%
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“…Therefore, the effects on thick oxides, such as the shallow trench isolation (STI), dominate the TID response of metal-oxide-semiconductor field-effect transistors (MOSFETs) [10]. Moreover, the charge trapped in the spacer oxide or at its interface modifies the parasitic series’ resistance, reducing the drive current [11].…”
Section: Introductionmentioning
confidence: 99%