Influence of magnetic field configuration on plasma characteristics and thin film properties in dual magnetron reactive high power impulse magnetron sputtering discharge with Al in Ar/O2 mixture

Zhou, Guangxue; Wang, Langping; Yu, Yonghao

doi:10.1016/j.surfcoat.2021.126837

Cited by 11 publications

(2 citation statements)

References 71 publications

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“…Table I shows ion flux measured in three different sputtering systems, i.e. a DC magnetron, 37) a high-power impulse magnetron sputtering (HiPIMS), 38) and in the plasma source used in this work. These previous works on the DC magnetrons and the HiPIMS 37,38) have not reported the spatial profile of the ion flux, but the maximum value of its radial profile.…”

Section: Spatial Profiles Of the Ion Flux To The Substrate At Various...mentioning

confidence: 99%

“…a DC magnetron, 37) a high-power impulse magnetron sputtering (HiPIMS), 38) and in the plasma source used in this work. These previous works on the DC magnetrons and the HiPIMS 37,38) have not reported the spatial profile of the ion flux, but the maximum value of its radial profile. Comparing the ion flux in these sputtering systems is difficult because of the different experimental conditions.…”

Section: Spatial Profiles Of the Ion Flux To The Substrate At Various...mentioning

confidence: 99%

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Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al₂O₃ targets

Ohtsu

Hara

Imoto

et al. 2023

Jpn. J. Appl. Phys.

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Spatial structures of the ion flux to the substrate are measured in a rf ring-shaped magnetized sputtering plasma with two facing cylindrical ZnO/Al2O3 targets at various argon gas pressures of 0.13, 0.67 and 0.93 Pa. Spatial distributions of the Hall parameter and Larmor radius of electrons and ions are also discussed by using simulated values of the magnetic flux density. The magnitude of the ion flux for 0.13 and 0.67 Pa is of the order of 1020 m-2s-1, while for 0.93 Pa it is of the order of 1021 m-2s-1 at a fixed rf power of 20 W. The radial profile of the ion flux has a peak at the position of the ring-shaped groove near a rf electrode and then becomes uniform further away from the electrode at all gas pressures. It is found that the axial profile of the deviation from a uniform profile estimated from the radial profile of the ion flux has two decay characteristics (1st decay length of 13.9 - 17.5 mm and 2nd decay length of 52.6 - 66.7 mm) and their decay lengths decrease with increasing the gas pressure.

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Section: Spatial Profiles Of the Ion Flux To The Substrate At Various...mentioning

confidence: 99%

Section: Spatial Profiles Of the Ion Flux To The Substrate At Various...mentioning

confidence: 99%

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al₂O₃ targets

Ohtsu

Hara

Imoto

et al. 2023

Jpn. J. Appl. Phys.

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Enhanced crystalline growth of Cr2AlC MAX phase coating by hybrid DCMS/HiPIMS

Zhou,

Li,

Yuan

et al. 2024

Applied Surface Science

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Influence of cylindrical magnetron sputtering configurations on plasma characteristics

Bard

Abbas

2023

Optik

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Influence of magnetic field configuration on plasma characteristics and thin film properties in dual magnetron reactive high power impulse magnetron sputtering discharge with Al in Ar/O2 mixture

Cited by 11 publications

References 71 publications

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al₂O₃ targets

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al₂O₃ targets

Enhanced crystalline growth of Cr2AlC MAX phase coating by hybrid DCMS/HiPIMS

Influence of cylindrical magnetron sputtering configurations on plasma characteristics

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Influence of magnetic field configuration on plasma characteristics and thin film properties in dual magnetron reactive high power impulse magnetron sputtering discharge with Al in Ar/O2 mixture

Cited by 11 publications

References 71 publications

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al2O3 targets

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al2O3 targets

Enhanced crystalline growth of Cr2AlC MAX phase coating by hybrid DCMS/HiPIMS

Influence of cylindrical magnetron sputtering configurations on plasma characteristics

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Resources

About

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al₂O₃ targets

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al₂O₃ targets