2019
DOI: 10.1016/j.mee.2019.110983
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Influence of magnetic field on the operation of TiN/Ti/HfO2/W resistive memories

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Cited by 11 publications
(7 citation statements)
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“…Each memristor consists of a metal/insulator/metal structure in which the conductance of the insulator can be set to different values by applying electrical stresses. [16][17][18] In this type of device, the conductance change is driven by the formation and disruption of a conductive nanofilament across the insulating film, [19][20][21][22][23][24] and in many cases the disruption of the filament (and therefore the reset event) is a thermal effect. [25,26] Therefore, studying the temperature of the memristor with a high lateral resolution (below 100 nm) is very important to understand the functioning of these devices.…”
Section: Resultsmentioning
confidence: 99%
“…Each memristor consists of a metal/insulator/metal structure in which the conductance of the insulator can be set to different values by applying electrical stresses. [16][17][18] In this type of device, the conductance change is driven by the formation and disruption of a conductive nanofilament across the insulating film, [19][20][21][22][23][24] and in many cases the disruption of the filament (and therefore the reset event) is a thermal effect. [25,26] Therefore, studying the temperature of the memristor with a high lateral resolution (below 100 nm) is very important to understand the functioning of these devices.…”
Section: Resultsmentioning
confidence: 99%
“…( 1) to account for the finite difference approximation to the first derivative with excellent results; nevertheless, if the numerical noise was high, a more complex methodology was implemented [47]. It has to be considered that the measurement conditions can complicate this calculation, for instance, high current variations might occur in these devices under the influence of external fields [48] and high temperatures; in these cases, other numerical approaches can do better [47,49,50]. Around the derivative maximum (see Fig.…”
Section: Methods 1 For Set (Ms1) Determination Of the Current Derivat...mentioning
confidence: 99%
“…The devices analyzed here were fabricated at the Institute of Microelectronics of Barcelona (CNM-CSIC) [18,20,21] and measured in our laboratory at the University of Granada. A scheme of the structures fabricated and measured is shown in Figure 1a.…”
Section: The Problemmentioning
confidence: 99%