Influence of negative bias pulse parameters on accumulation of macroparticles on the substrate immersed in titanium vacuum arc plasma

Ryabchikov, A. I.; Anan'in, P.S.; Sivin, D. O.; Dektyarev, S. V.; Bumagina, A. I.; Shevelev, A. É.; Andriyashin, Dmitry A.

doi:10.1016/j.surfcoat.2016.06.026

Cited by 10 publications

(3 citation statements)

References 16 publications

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“…Several mechanisms have been proposed for the explanation of the decrease of macro particle attachment with the use of high voltage biasing, including enhanced ion sputtering of the protruding MPs [27], removal of loosely bonded MPs due to the incident high energy ions [28,29], evaporation of MPs in the sheath as a result of their collision with the high energy ions [30] and reflection of them by the sheath electric field [31,32] repeated negative charging of MPs due to the oscillations of plasma sheath thickness under pulsed bias, contrary to the stable plasma sheath thickness in the case of DC bias [33].…”

Section: Structural and Morphological Investigations Of The Coatingsmentioning

confidence: 99%

The corrosion protection ability of TiAlN coatings produced with CA-PVD under superimposed pulse bias

Azar

Kazmanlı

et al. 2018

Surface and Coatings Technology

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Section: Structural and Morphological Investigations Of The Coatingsmentioning

confidence: 99%

The corrosion protection ability of TiAlN coatings produced with CA-PVD under superimposed pulse bias

Azar

Kazmanlı

et al. 2018

Surface and Coatings Technology

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“…Employing a magnetic field, parallel to the propagation direction of the plasma jet, the ions concentrated on this direction and the plasma density increases. Thus, the deposition rate increases and the fraction of MPs decreases [4], Other studies, show that increasing the frequency and width of the pulses decreases the number of macroparticles [5]. Deposition of MPs into the substrate was significantly decreased after 1 min of processing at bias [6], applying short-pulsed bias leads to a 250-fold decrease in total macro particle number [7].…”

Section: Introductionmentioning

confidence: 94%

Distribution of profiles and macroparticles in coatings obtained by continuous cathodic arc using a straight magnetic concentrator

Bermeo-Acosta

Narváez

2020

DYNA

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Thin films of Ti and Cu were deposited on 316 stainless steel substrates by the continuous cathodic arc technique with magnetic concentrator in a straight duct. Samples obtained at different cathode-substrate distances, for positions within the magnetic concentrator. The morphology of the surface was determined by electron scanning microscopy (SEM). The average thickness of the films was measured from the deposited mass; the profiles of the films were also studied from measurements with a Calotest in different points of the samples and with a profilometer, the coefficient of friction and wear were characterized with a tribometer; the hardness with a nanoindenter. The results showed that the average thickness increased by the action of the magnetic concentrator, although this causes the samples to have a central region of maximum thickness and that the thickness decreased up to 50% in a radius of about 1 cm. The films were rough with presence of macroparticles. The number of macroparticles, the film roughness and the deposition rate were also analyzed; the deposition rate depended on the axial position inside the duct. The number of macroparticles diminished with increasing axial position, the friction coefficient and wear rate diminished when the substrate was placed farther from the cathode, inside the magnetic duct. The hardness value measured with a nanoindenter is about the order as the reported in the literature; the lowest coefficients of friction, the least wear and the highest values of hardness were obtained in the region where the magnetic field is highest.

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“…Numerous studies of decreasing MPs contamination were referred, such as curve magnetic filtering duct [7,8], DC negative bias to the substrates [9,10], shield plate installed between cathode and substrates [11] or by optimizing technological parameters such as increasing gas flow rate and reduction arc current [12,13] were studied extensively. However, most research focus on eliminate the MPs during their transport to the substrates rather than suppress MPs emission from cathode at the evaporation stage.…”

Section: Introductionmentioning

confidence: 99%

Control of vacuum arc source cathode spots contraction motion by changing electromagnetic field

Song

Wang

Lin

et al. 2018

Plasma Sci. Technol.

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This paper investigates the magnetic field component impact on cathode spots motion trajectory and the mechanism of periodic contraction. Electromagnetic coils and permanent magnets were installed at the different sides of cathode surface, the photographs of cathode spots motion trajectory were captured by a camera. Increasing the number of magnets and decreasing the distance between magnets and cathode both lead to enhancing cathode spots motion velocity. Radii of cathode spots trajectory decrease gradually with the increasing of electromagnetic coil's current, from 40 mm at 0 A to 10 mm at 2.7 A. Parallel magnetic field component intensity influence the speed of cathode spots rotate motion, and perpendicular magnetic field component drives spots drift in the radial direction. Cathode spot's radial drift is controlled by changing the location of the 'zero line' where perpendicular magnetic component shifts direction and the radius of cathode spots trajectory almost equal to 'zero line'.

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Influence of negative bias pulse parameters on accumulation of macroparticles on the substrate immersed in titanium vacuum arc plasma

Cited by 10 publications

References 16 publications

The corrosion protection ability of TiAlN coatings produced with CA-PVD under superimposed pulse bias

The corrosion protection ability of TiAlN coatings produced with CA-PVD under superimposed pulse bias

Distribution of profiles and macroparticles in coatings obtained by continuous cathodic arc using a straight magnetic concentrator

Control of vacuum arc source cathode spots contraction motion by changing electromagnetic field

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