Influence of O2 flow rate on the structural properties of MgO films deposited by dual magnetron sputtering

Fabrication techniques and material properties of dielectric MgO thin films—A status review

“…The anode becomes a cathode during the half-wave; the covering insulating layer will be sputtered away. Using this dual magnetron sputtering technique, MgO films were deposited and the secondary electron emission properties of the film were investigated using a diode discharge device [74].…”

“…The h2 2 0i peak fades away with the increase of deposition rate and the h2 0 0i peak appeared. The influence of O 2 flow rate on the structural properties of the film was systematically studied by Cheng et al [74,149]. As the O 2 flow rate is increased, the intensity ratio of the h1 1 1i to h2 0 0i peak of cubic MgO phase increases significantly, leading to a change of the film texture from a combined h1 0 0i and h1 1 1i preferred orientation to a highly preferred orientation.…”

Crystal growth of MgO thin films deposited on ZnO underlayers by magnetron sputtering

“…Several kinds of deposition methods have been reported for MgO deposition; electron-beam evaporation [1][2][3][4], dc magnetron sputtering [5], rf magnetron sputtering [1,6,7], pulsed mid-frequency magnetron sputtering [8,9], metal-organic chemical vapor deposition [10,11], sol-gel deposition [12] and ion-beam-assisted deposition [13]. Among these deposition methods, electron-beam evaporation is typically used for MgO thin film deposition in PDP mass production.…”

“…However, magnetron sputtering is considered an alternative technique because it has the advantage of producing uniform coatings over large areas. It has already been reported that MgO thin films have been successfully deposited with a dual magnetron sputtering system using a Mg metal target, which has several advantages with respect to processing stability and high deposition rates [9]. The properties of MgO thin films depend on their microstructural properties, such as crystal orientation [9]; therefore, their structure-property relationship has been investigated as a function of sputter deposition conditions such as oxygen gas partial pressure [9] and gas pressure [7].…”

Characterization of the biaxial textures of MgO thin films grown by E-beam evaporation

“…Actually in many previous reports the preferred orientation of the MgO films varies from the stated (2 0 0), (1 1 1) or (2 2 0) and the crystallinity also varies with minor changes of preparation conditions. 5,7,9,12 In this study we report a novel method for determining the inplane as well as the out-of-plane texture of MgO thin films using XRD diffraction. By this method the in-plane and out-of-plane preferred orientations can be clearly identified.…”