Influence of oil contamination on the optical performance and laser induced damage of fused silica

Influence of surface roughness on interfacial adsorption and laser ablation mechanisms of organic contaminants on fused silica

“…However, they are susceptible to damage caused by surface imperfections and the presence of organic contaminants when exposed to intense laser radiation. The damage threshold of fused silica significantly decreases as contamination levels rise 10 . Additionally, the manufacturing process itself can contribute to this issue by allowing for the deposition and absorption of organic contaminants onto the processed fused silica surface, further exacerbating damage to the components 11,12 .…”

Analysis of grating surface organic contamination in chirped pulse amplification system

“…The main reasons for the damage of optical components under intense laser irradiation are high power density, uneven field intensity, material characteristics and surface contamination [8] . Although the damage threshold of optical components can be improved by increasing the size of optical components, optimizing near-field distribution, coating treatment, laser pretreatment and cleaning process, the performance of optical components is still gradually decreased after long-term use in high-power laser facilities, which is mainly due to the contamination in vacuum environment [9][10][11][12][13][14] . Under intense laser irradiation, the damage threshold of contaminated optical components decreases by about 60%, and the damage defect area increases significantly [15] .…”

Elucidating the surface damage behavior of sol-gel silica anti-reflective films during low-pressure plasma cleaning

“…The surface quality of optical components is more demanding with the further increase of the output energy of highpower laser facilities [1][2][3] . The optical components suffered from serious organic contamination after long-term service in the high vacuum environment, resulting in a sharp decline in optical performance [4,5] . Compared with other chemical cleaning methods, plasma cleaning can realize efficient and non-destructive cleaning of optical components, which has been widely used in in-situ cleaning of large aperture optical components by physical bombardment and chemical reactions with organic contaminants [6][7][8] .…”