2014
DOI: 10.1063/1.4862797
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Influence of oxygen content of room temperature TiO2−x deposited films for enhanced resistive switching memory performance

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Cited by 49 publications
(24 citation statements)
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“…Such kind of current transport mechanism has been well illustrated by spacecharge-limited current (SCLC) effect [4,22]. According to Bousoulas's study [9], it is believed that the distinct RS behaviors mainly originate from the variation of intrinsic defects (oxygen vacancy) in the film due to thermal annealing process. The as-deposited sample was in substoichiometric state due to the nonuniform reaction during deposition, which results in the random filaments in the film.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Such kind of current transport mechanism has been well illustrated by spacecharge-limited current (SCLC) effect [4,22]. According to Bousoulas's study [9], it is believed that the distinct RS behaviors mainly originate from the variation of intrinsic defects (oxygen vacancy) in the film due to thermal annealing process. The as-deposited sample was in substoichiometric state due to the nonuniform reaction during deposition, which results in the random filaments in the film.…”
Section: Resultsmentioning
confidence: 99%
“…Among the proposed models [3][4][5][6][7], conductive filament seems to attract remarkable attention as the origin of RS due to its applicability on a wide range of materials and the existence of indisputable experimental clues [8]. It is reported that oxygen vacancies are possible filaments [9]. Thus the random RS can be improved by modulating the oxygen vacancies in the film.…”
Section: Introductionmentioning
confidence: 99%
“…In general, the resistance of the memristor containing conducting filaments is determined by the diameter or thickness of the filament. 39 The priming D-spike reduced the thickness of the conducting filaments without rupturing those filaments, which resulted in only a slight decrease in the current of the NKN memristor. On the other hand, when a D-spike was applied after a priming D-spike (state IV), the NKN memristor exhibited insulating properties, which indicates that the conducting filament had ruptured.…”
Section: Resultsmentioning
confidence: 99%
“…This shows the decrease of the oxygen vacancy concentration and the increase of the content of Ta 2 O 5 . These cases led to a smaller size of vacancy based filaments when the devices were in LRS [26].…”
Section: The Drastic Reduction Of Reset Current and Improvement Of Dementioning
confidence: 96%