Abstract:In this work, we investigated the influence of oxygen plasma on the growth of nickel cobaltite (errortypeceNiCo2O4) thin films compared to growth in a molecular oxygen atmosphere. The films were grown on MgO (001), errortypeceMgAl2O4(001) and errortypeceSrTiO3(001) substrates by oxygen plasma (atmosphere of activated oxygen)-assisted and reactive molecular beam epitaxy (molecular oxygen atmosphere). Soft X-ray photoelectron spectroscopy showed that only the use of oxygen plasma led to a spectrum characteristic… Show more
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