2009
DOI: 10.1016/j.physc.2008.11.006
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Influence of oxygen reduction on the structural and electronic properties of electron-doped Sr1−xLaxCuO2 thin films

Abstract: Single phase, c-axis oriented, e-doped, Sr 1-x La x CuO 2 thin films were epitaxially grown on KTaO 3 and DyScO 3 substrates by reactive rf sputtering. As-grown films being insulating due to oxygen excess, oxygen reduction is necessary to observe superconductivity. Two different procedures were employed to reach superconductivity.On one hand an in-situ reduction process was conducted on a series of films deposited on both types of substrates. On the other hand, an ex-situ reduction procedure was performed sequ… Show more

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Cited by 24 publications
(43 citation statements)
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“…12 (b). In accordance with literature 27,48 we found that the c-axis decreases and the a-axis increases monotonically during reduction. Furthermore, we found that the unit cell volume V increases as well (cf.…”
Section: Vacuum Annealing Timesupporting
confidence: 93%
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“…12 (b). In accordance with literature 27,48 we found that the c-axis decreases and the a-axis increases monotonically during reduction. Furthermore, we found that the unit cell volume V increases as well (cf.…”
Section: Vacuum Annealing Timesupporting
confidence: 93%
“…As excess oxygen forms O 2− ions on interstitial sites, it traps free charge carriers from the CuO 2 planes, which increases the resistivity and suppresses superconductivity. Therefore, ρ 300K decreases and T c increases with the removal of excess oxygen, as reported before 27,48 . We further observed the reduction process by analyzing the evolution of the lattice constants with proceeding t a , as displayed in Fig.…”
Section: Vacuum Annealing Timesupporting
confidence: 72%
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“…IL cuprates are particularly interesting because of their crystallographic structure: the simplest among layered cuprates. On the other hand, the IL compounds are metastable and single crystal can be stabilized only in thin film form [23][24][25][26][27][28] .…”
Section: Introductionmentioning
confidence: 99%