2011
DOI: 10.1016/j.tsf.2011.01.197
|View full text |Cite
|
Sign up to set email alerts
|

Influence of PECVD parameters on the properties of diamond-like carbon films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

5
37
0

Year Published

2012
2012
2021
2021

Publication Types

Select...
10

Relationship

1
9

Authors

Journals

citations
Cited by 65 publications
(42 citation statements)
references
References 28 publications
5
37
0
Order By: Relevance
“…As example, smooth a-CH x films has been observed at low pressure work conditions, whereas the development of rougher microstructures were possible by increasing the pressure [13]. Other experimental parameters can provide different ratios of sp 2 and sp 3 carbon bonds and hydrogen contents [14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…As example, smooth a-CH x films has been observed at low pressure work conditions, whereas the development of rougher microstructures were possible by increasing the pressure [13]. Other experimental parameters can provide different ratios of sp 2 and sp 3 carbon bonds and hydrogen contents [14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…Plasma pre-treatments and DLC depositions are performed in a PECVD apparatus (Caschera et al 2011) operating at 13.56 MHz and room temperature. The H 2 or O 2 plasma etching is performed on the cotton substrates at room temperature and at 50 W RF power for 10, 30 and 60 min and 10 sccm of gas flow.…”
Section: Methodsmentioning
confidence: 99%
“…Synthesis of high-quality and controllable carbon films has been a hot spot for decades. Alternatively, ethanol has been considered as a useful precursor since its low-cost and environment-friendly [7,8]. Furthermore, plasma enhanced chemical vapor deposition (PECVD) has become a more promising way to prepare carbon film since it can lower deposition temperature and accelerate deposition rate.…”
Section: Introductionmentioning
confidence: 99%