2020
DOI: 10.1007/s10854-020-03803-y
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Influence of polyurethane-based polycarbonate diols with different structures induced via polymer processing on their dielectric properties

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Cited by 6 publications
(3 citation statements)
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“…Then, the relaxation time, τ, will be estimated as follows τ 0 = 1 2 π f true( false( false( ε normals 0.25em ε false) 2 + 0.25em ε 2 false) false( false( ε 0.25em ε false) 2 + 0.25em ε 2 false) true) 1 / 2 ( 1 α ) , 0 α 1 …”
Section: Resultsmentioning
confidence: 99%
“…Then, the relaxation time, τ, will be estimated as follows τ 0 = 1 2 π f true( false( false( ε normals 0.25em ε false) 2 + 0.25em ε 2 false) false( false( ε 0.25em ε false) 2 + 0.25em ε 2 false) true) 1 / 2 ( 1 α ) , 0 α 1 …”
Section: Resultsmentioning
confidence: 99%
“…Furthermore, this urethane incorporates numerous carbonyl and amine groups, which generate dipole moments in both the rigid and the supple segments of the polymer. This attribute favorably impacts the triboelectric properties of PBU by enabling the transfer of electrons between materials in contact, ultimately yielding high output performance . Simultaneously, two-dimensional (2D) Ti 3 C 2 T x MXene has attracted considerable attention due to its extensive surface area, which facilitates a tribonegative surface capable of amassing more charges and augmenting the output performance of the TENG device.…”
Section: Introductionmentioning
confidence: 99%
“…This attribute favorably impacts the triboelectric properties of PBU by enabling the transfer of electrons between materials in contact, ultimately yielding high output performance. 41 Simultaneously, two-dimensional (2D) Ti 3 C 2 T x MXene has attracted considerable attention due to its extensive surface area, which facilitates a tribonegative surface capable of amassing more charges and augmenting the output performance of the TENG device. Additionally, Ti 3 C 2 T x MXene can be seamlessly and securely integrated with fabrics owing to its surface-termination groups (−O, − OH, and − F).…”
Section: ■ Introductionmentioning
confidence: 99%