2022
DOI: 10.1007/s12633-022-01912-3
|View full text |Cite
|
Sign up to set email alerts
|

Influence of Radiation Heat Transfer on Mc-Si Ingot during Directional Solidification: A Numerical Investigation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

0
5
0

Year Published

2022
2022
2023
2023

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 14 publications
(5 citation statements)
references
References 14 publications
0
5
0
Order By: Relevance
“…An argon gas purge is used to regulate the atmosphere inside the growth chamber at pressures between 20 and 100 m bar. [ 15–23 ]…”
Section: Si Ingot Growth Techniquementioning
confidence: 99%
See 1 more Smart Citation
“…An argon gas purge is used to regulate the atmosphere inside the growth chamber at pressures between 20 and 100 m bar. [ 15–23 ]…”
Section: Si Ingot Growth Techniquementioning
confidence: 99%
“…An argon gas purge is used to regulate the atmosphere inside the growth chamber at pressures between 20 and 100 m bar. [15][16][17][18][19][20][21][22][23] A seed crystal with a specified crystallographic orientation is brought into contact with the melt after the feedstock has fully melted. The temperature has been adjusted to nearly the silicon's melting point.…”
Section: Cz Techniquementioning
confidence: 99%
“…In order to control the heat extraction in the DS furnaces the geometrical structure of the furnace is modified. [1,2] Nagarajan et al, have investigated the addition of an insulation block in the DS furnace both numerically and experimentally. The results conclude that this modification reduces power consumption and enhances the growth rate.…”
Section: Introductionmentioning
confidence: 99%
“…The quality of mc-Si ingots has been enhanced by keerthivasan et al through modifications made to the furnace geometry. [7][8][9] Extensive research has been conducted by Sugunraj et al to investigate the grain structure and impurity concentrations within mc-Si [10] and by Madhesh et al to investigate the temperature control and carbon oxygen concentration within mc-Si. [11] The saw damage removal, surface cleaning, polishing, and texturing of silicon wafer surfaces, as well as the recycling of silicon materials, are all obtained by wet-chemical etching processing.…”
Section: Introductionmentioning
confidence: 99%
“…through modifications made to the furnace geometry. [ 7–9 ] Extensive research has been conducted by Sugunraj et al. to investigate the grain structure and impurity concentrations within mc‐Si [ 10 ] and by Madhesh et al.…”
Section: Introductionmentioning
confidence: 99%