Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering

Straňák, Vítězslav; Hubička, Zdeněk; Čada, Martin; Bogdanowicz, Robert; Wulff, H.; Helm, Christiane A.; Hippler, R.

doi:10.1088/1361-6463/aaa9e6

Cited by 13 publications

(4 citation statements)

References 76 publications

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“…The intensity of Ar II lines strongly increases with the addition of oxygen to the HiPIMS discharge in contrast to the DCMS discharge where the intensity slightly decreases. A similar rise of Ar + line emission was reported for a HiPIMS discharge with oxidised Nb and Fe cathodes [51,52].…”

Section: Optical Emission Spectroscopysupporting

confidence: 80%

Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target

Hippler

Čada

Straňák

et al. 2019

Plasma Sources Sci. Technol.

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Reactive high power impulse magnetron sputtering (HiPIMS) of a cobalt cathode in pure argon gas and with different oxygen admixtures was investigated by time-resolved optical emission spectroscopy (OES) and time-integrated energy-resolved mass spectrometry. The HiPIMS discharge was operated with a bipolar pulsed power supply capable of providing a large negative voltage with a typical pulse width of 100 μs followed by a long positive pulse with a pulse width of about 350 μs. The HiPIMS plasma in pure argon is dominated by Co+ ions. With the addition of oxygen, O+ ions become the second most prominent positive ion species. OES reveals the presence of Ar I, Co I, O I, and Ar II emission lines. The transition from an Ar+ to a Co+ ion sputtering discharge is inferred from time-resolved OES. The enhanced intensity of excited Ar+* ions is explained by simultaneous excitation and ionisation induced by energetic secondary electrons from the cathode. The intensity of violet Ar I lines is drastically reduced during HiPIMS. Intensity of near-infrared Ar I lines resumes during the positive pulse indicating an additional heating mechanism.

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Section: Optical Emission Spectroscopysupporting

confidence: 80%

Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target

Hippler

Čada

Straňák

et al. 2019

Plasma Sources Sci. Technol.

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“…The HiPIMS process is further utilised for the deposition of compound layers such as oxides [44][45][46][47] or nitrides [48][49][50][51]. The reactive HiPIMS process-similar to the reactive dcMS process-is subject to hysteresis behaviour [52], which in HiPIMS can be suppressed or even avoided by the back-attraction of the ionised sputtered particles to the target as has been shown in the literature [53,54].…”

Section: Introductionmentioning

confidence: 99%

Temporal studies of titanium ionised density fraction in reactive HiPIMS with nitrogen admixture

Bernátová¹,

Klein²,

Hnilica³

et al. 2021

Plasma Sources Sci. Technol.

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Temporal evolutions of the ground state number densities of titanium atoms and ions and the ionised density fraction during pulse on-time are experimentally investigated for the high-power impulse magnetron sputtering process in an Ar and Ar/N2 atmosphere. For the study, two distinct pulses with the same pulse length at a constant average power but different pulse off-times were selected. In both conditions, four representative points within the hysteresis curve were chosen, and the time evolutions of sputtered species densities were investigated in both the target and the substrate regions. At the pulse beginning, a high density of residual particles sputtered during the previous pulse is present in both studied regions. In the target region, in conditions of longer pulse off-time and thus higher peak discharge current, 95% of sputtered particles are ionised in metallic, transition and compound regimes. With shorter pulse off-time conditions, and thus a lower peak discharge current, the ionised density fraction is the lowest in the metallic regime; in the transition and compound regimes, it exceeds 80%. In the substrate region, the temporal evolution of sputtered species densities differs from that obtained in the target region. After the pulse ignition, titanium atoms and ions remaining near the substrate from the previous pulse are pushed away. In the metallic regime, the sputtered atoms refill the substrate region already during the pulse on-time in both the low- and high-current conditions. In the high-current conditions, the titanium ions arrive at the substrate together with the sputtered atoms; however, in the low-current conditions, the titanium ion density decreases during the pulse on-time, and the titanium ions arrive later during the pulse off-time. In the transition and compound regimes, both densities steadily decrease during the pulse on-time and the titanium atoms and ions arrive at the substrate during the pulse off-time.

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“…New and highly reactive species appear with the addition of oxygen to the discharge. Reactive oxygen species can have a large influence on the properties of deposited films [19]. In this paper we investigate the ion composition in a magnetron sputtering discharge with a titanium target.…”

Section: Introductionmentioning

confidence: 99%

Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge

et al. 2019

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Formation of singly and doubly charged Ar q+ and Ti q+ (q=1,2) and of molecular Ar 2 + , ArTi + , and Ti 2 + ions in a direct current magnetron sputtering discharge with a Ti cathode and argon as working gas was investigated with the help of energy-resolved mass spectrometry. Measured ion energy distributions consist of low-energy and high-energy components resembling different formation processes. Intensities of Ar 2 + and ArTi + dimer ions strongly increase with increasing gas pressure. Addition of oxygen gas leads to the formation of positively charged O + , O 2 + , and TiO + and of negatively charged O − and O 2 ions. ExperimentThe experimental set-up has been described in detail before [20][21][22]. The experiment is performed in a vacuum chamber which is pumped to a base pressure of less than 10 −5 Pa. Argon (purity 99.999%) and oxygen gas OPEN ACCESS RECEIVED

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Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering

Cited by 13 publications

References 76 publications

Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target

Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target

Temporal studies of titanium ionised density fraction in reactive HiPIMS with nitrogen admixture

Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge

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