2023
DOI: 10.2139/ssrn.4332465
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Influence of Si Surface Preparation on Cosi2 Formation And Agglomeration

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“…Physical vapor deposition growth processes are very efficient where hills of agglomerated films can be grown through introducing tensile stress 18 23 The formation rate of the material agglomeration varies with respect to the dewetting temperature, the initial thickness of the films, strain of the grown NPs, and surface defect states 15 .…”
Section: Introductionmentioning
confidence: 99%
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“…Physical vapor deposition growth processes are very efficient where hills of agglomerated films can be grown through introducing tensile stress 18 23 The formation rate of the material agglomeration varies with respect to the dewetting temperature, the initial thickness of the films, strain of the grown NPs, and surface defect states 15 .…”
Section: Introductionmentioning
confidence: 99%
“…Physical vapor deposition growth processes are very efficient where hills of agglomerated films can be grown through introducing tensile stress. [18][19][20][21][22][23] The formation rate of the material agglomeration varies with respect to the dewetting temperature, the initial thickness of the films, strain of the grown NPs, and surface defect states. 15 The choice of the substrate is also an added factor, which influences the growth dynamics, the size and distribution of the formed NPs, their structure, and their shape.…”
Section: Introductionmentioning
confidence: 99%