1984
DOI: 10.1016/0042-207x(84)90180-5
|View full text |Cite
|
Sign up to set email alerts
|

Influence of substrate material on the initial thin film growth during ion deposition from a glow discharge

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
4
1

Year Published

1989
1989
2016
2016

Publication Types

Select...
4
3

Relationship

0
7

Authors

Journals

citations
Cited by 8 publications
(5 citation statements)
references
References 3 publications
0
4
1
Order By: Relevance
“…Certainly, the conditions in TS are very different from the conditions in the experiments reported in [13][14][15], where those data were obtained, and materials of mirror samples also differed from the samples of experiments reported in [13,14]. However, for us it is important that the sticking probability of the carbon-containing deposit may be different for different materials, i.e.…”
Section: Discussioncontrasting
confidence: 52%
See 2 more Smart Citations
“…Certainly, the conditions in TS are very different from the conditions in the experiments reported in [13][14][15], where those data were obtained, and materials of mirror samples also differed from the samples of experiments reported in [13,14]. However, for us it is important that the sticking probability of the carbon-containing deposit may be different for different materials, i.e.…”
Section: Discussioncontrasting
confidence: 52%
“…They demonstrated that in similar experimental conditions of a discharge in a CH 4 + Ar mixture, the thicknesses of deposited carbon film were different, decreasing along the substrate raw silicon, platinum, aluminium and zirconium. For this, the differences between the pair silicon and platinum on the one hand and the pair aluminium and zirconium on the other hand were much less than the difference between the pair platinum and aluminium (see figure 3 in [14]). Berg et al did not discuss the reason for the differences in the sticking coefficients of the substrates that they investigated (e.g.…”
Section: Discussionmentioning
confidence: 93%
See 1 more Smart Citation
“…162 The roughness of DLC films has been shown to depend on the various deposition methods 163,164 and deposition parameters such as ion energy, [165][166][167][168][169][170] gas mixture 163 and bias voltage. 169 Coating roughness is also dependent on substrate material [171][172][173] and the underlying substrate roughness. Increasing the substrate temperature during deposition results in a higher proportion of sp 2 bonding, creating a more graphitic and therefore rougher surface.…”
Section: Film Roughnessmentioning
confidence: 99%
“…Selective deposition of a metal film has been demonstrated by using rf-bias sputtering in an argon atmosphere [186,187]. The substrate bias etching rate is set approximately equal to the deposition rate.…”
Section: Emerging Technologiesmentioning
confidence: 99%