Influence of Substrate Temperature and Plasma Power Density on the Properties of Plasma-Assisted Chemical Vapor Deposited Titanium Nitride

Crummenauer, J.; Stock, H.‐R.; Mayr, P.

doi:10.1080/10426919508935107

Cited by 7 publications

(2 citation statements)

References 14 publications

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“…Titanium nitride (TiN) as a chemical compound has an excellent combination of physical, chemical, electrical, as well as mechanical properties . It is an extremely hard ceramic material with gold appearance, widely used for decoration and coating on other material surfaces.…”

Section: Introductionmentioning

confidence: 99%

“…Titanium nitride (TiN) as a chemical compound has an excellent combination of physical, chemical, electrical, as well as mechanical properties. [40][41][42][43] It is an extremely hard ceramic material with gold appearance, widely used for decoration and coating on other material surfaces. Besides, titanium nitride is a inert conducting material, [44] and patterned TiN can be a candidate for microelectrode arrays.…”

Section: Introductionmentioning

confidence: 99%

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DNA sequencing with titanium nitride electrodes

Chen

2013

Int. J. Quantum Chem

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We construct a hydrogen‐bond based metal–molecule–metal junction, which contains two identical “reader” molecules, one single DNA base as a bridged molecule, and two titanium nitride electrodes. Hydrogen bonds are formed between “reader” molecules and DNA base, whereas titanium–sulfur bonds are formed between “reader” molecules and titanium nitride electrodes. We perform electronic structure calculations for both the bare bridged molecule and the full metal–molecule–metal system. The projected density of states shows that when the molecule is connected to the titanium nitride electrode, the energy levels of the bridged molecule are shifted, with an indirect effect on the hydrogen bonds. This is similar to the case for a gold electrode but with a more pronounced effect. We also calculate the current–voltage characteristics for the molecular junctions containing each DNA base. Results show that titanium nitride as an electrode can generate distinct conductance for each DNA base, providing an alternative electrode for DNA sequencing. © 2013 Wiley Periodicals, Inc.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

DNA sequencing with titanium nitride electrodes

Chen

2013

Int. J. Quantum Chem

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Evaluation of Thin Film Titanium Nitride Electrodes for Electroanalytical Applications

Kirchner¹,

Hallmeier²,

Szargan³

et al. 2007

Electroanalysis

125

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Titanium nitride is a hard and inert conducting material that has yet not been widely used as electrode material for electroanalytical applications although there are highly developed protocols available to produce well adherent micro and nanostructured electrodes. In this paper the possibilities of using titanium nitride thin films for electroanalytical applications is investigated. Scanning electrochemical microscope (SECM) was used for analysis of the redox kinetics of a selected fast redox couple at thin films of titanium nitride (TiN) in different thicknesses. The investigation was carried out by approaching an amperometric ultramicroelectrode (UME) to the TiN film while the soluble redox couple (ferrocenemethanol/ferrociniummethanol) served as mediator in a SECM configuration. The substrate was biased at a potential so that it rereduces the species being produced at the UME, thus controlling the feedback effect. Normalized current -distance curves were fitted to the theoretical model in order to find the apparent heterogeneous standard rate constant (k8) at the sample. The data are further supported by structural investigation of the TiN films using scanning force microscopy and X-ray photoelectron spectroscopy. It was found that the kinetics are little influenced by prolonged storage in air. The heterogeneous standard rate constants in 2 mM ferrocenemethanol were (0.73 AE 0.05) Â 10 À3 cm s À1 for 20 nm TiN thin layer, (1.5 AE 0.2) Â 10 À3 cm s À1 for 100 nm TiN thin layer and (1.3 AE 0.2) Â 10 À3 cm s À1 for 300 nm TiN thin layer after prolonged storage in air. Oxidative surface treatment (in order to remove organic adsorbates) decreased the kinetics in agreement with a thicker oxide layer on the material. The results suggest that their direct use for amperometric detection of reversible redox systems in particular at miniaturized configurations may be advantageous.

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The effect of surface chemistry and nanotopography of titanium nitride (TiN) films on 3T3-L1 fibroblasts

Cyster

Parker

et al. 2003

J. Biomed. Mater. Res.

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The cell-material interaction of 3T3-L1 fibroblasts with TiN films was studied in vitro. TiN films were deposited onto glass substrates to thicknesses of 0.2 and 1.0 microm by pulsed dc reactive magnetron sputtering. For comparison TiN films were deposited by closed field unbalanced magnetron sputter ion plating by Teer Coatings Ltd. (Hartlebury, UK) to result in TiN films with similar surface chemistries but having increased topographical features. TiN films were characterized using X-ray diffraction, X-ray photoelectron spectroscopy, and atomic force microscopy. The cell-material interaction was examined morphologically by monitoring fibroblast attachment and growth and comparing to a control substrate. At early time points increased numbers of 3T3-L1 fibroblasts were found to preferentially attach to TiN films with an increase in the percentage of surface interstitial nitrogen and also with decreased topographical features. At later time points the presence of nanotopography appeared to play a greater role than the effects of surface chemistry and resulted in increased numbers of attached 3T3-L1 fibroblasts. The results show that by changing the deposition route and parameters to produce TiN films, the resultant films can be used to investigate the cellular response to surfaces of differing chemistry and topography.

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Influence of Substrate Temperature and Plasma Power Density on the Properties of Plasma-Assisted Chemical Vapor Deposited Titanium Nitride

Cited by 7 publications

References 14 publications

DNA sequencing with titanium nitride electrodes

DNA sequencing with titanium nitride electrodes

Evaluation of Thin Film Titanium Nitride Electrodes for Electroanalytical Applications

The effect of surface chemistry and nanotopography of titanium nitride (TiN) films on 3T3-L1 fibroblasts

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