The deposition technique is responsible for the morphological and crystalline properties of the thin films obtained by spray pyrolysis. The influence of the deposition parameters on the WO3 films properties is presented. The main characterisation concerns the topography (AFM), crystalline parameters (XRD), surface tensions (contact angle) and opto‐electronic properties. Due to the changes on the deposition parameter, dense and porous WO3 films were obtained with radically different interface properties. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)