2018
DOI: 10.1016/j.jcrysgro.2018.05.004
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Influence of substrates and rutile seed layers on the assembly of hydrothermally grown rutile TiO 2 nanorod arrays

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Cited by 11 publications
(12 citation statements)
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“…As the nanofinger growth proceeds, the diameter decreases by approximately 5%. This is attributed to changing process parameters such as temperature and precursor concentration during the growth process [35,39]. The decrease in diameter causes cracks in the film as shown in the inset of Figure 1A.…”
Section: Resultsmentioning
confidence: 99%
“…As the nanofinger growth proceeds, the diameter decreases by approximately 5%. This is attributed to changing process parameters such as temperature and precursor concentration during the growth process [35,39]. The decrease in diameter causes cracks in the film as shown in the inset of Figure 1A.…”
Section: Resultsmentioning
confidence: 99%
“…The ART process is based on nucleation and growth, which depends on many variables such as the sample preparation method, heat flow, and dopants . For the anatase/rutile mixture, the larger portion (17.63 wt.%) dopant rutile is likely to contribute to the crystallization of rutile, which results in greater rutile generation. On the other hand, a small portion of dopant (2.4 wt% WO 3 ) and with the small percentage resulting rutile portion (2.92%) it is hard to tell if WO 3 contributed significantly to the ART.…”
Section: Resultsmentioning
confidence: 99%
“…In case of conventional electron-beam lithography, titanium was deposited on a patterned electron resist. After removing the mask, the titanium was oxidized at 850 °C resulting in polycrystalline rutile seeds along the pattern lines as we described previously [36]. The seed grains have diameters between 5 and 100 nm and hence, their dimensions are similar to those of the nanorods.…”
Section: Resultsmentioning
confidence: 99%
“…The aluminium was dissolved in a 0.5 molar NaOH bath within 12 s. The samples were developed in methyl isobutyl ketone (MIBK) for 25 s and cleaned with isopropanol. In case of electron-beam lithography, a polycrystalline rutile TiO 2 films was fabricated as a seed layer for the hydrothermal growth process as we described in detail in our previous work [36]. For that purpose, a 40 nm thin titanium layer was deposited via electron-beam assisted evaporation from titanium pellets (99.995% purity, Kurt J. Lesker Ltd.) at a pressure of 1 .…”
Section: Methodsmentioning
confidence: 99%
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