2020
DOI: 10.1016/j.msec.2020.111065
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Influence of surface pre-treatment with mechanical polishing, chemical, electrochemical and ion sputter etching on the surface properties, corrosion resistance and MG-63 cell colonization of commercially pure titanium

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Cited by 22 publications
(10 citation statements)
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“…For the Fe 57 Co 10 B 20 Si 5 Nb 4 V 4 sample, the maximum phase angle was about 60°, indicating a more nonuniform charging and discharging double layer on the surface [ 41 ]. However, the CPE values for the Fe 67 Co 10 B 12 Si 9 Nb 2 sample were about one order in magnitude higher than the Fe 62 Co 15 B 14 Si 9 and Fe 57 Co 10 B 20 Si 5 Nb 4 V 4 samples, which can be a result of increased absorption of water in defect during the corrosion process and expanded the capacitance interface [ 42 ]. R ct was correlated with the dissolution of Fe and resistance of chargé transfer at the double layer on the electrolyte/substrate interface [ 43 ].…”
Section: Resultsmentioning
confidence: 99%
“…For the Fe 57 Co 10 B 20 Si 5 Nb 4 V 4 sample, the maximum phase angle was about 60°, indicating a more nonuniform charging and discharging double layer on the surface [ 41 ]. However, the CPE values for the Fe 67 Co 10 B 12 Si 9 Nb 2 sample were about one order in magnitude higher than the Fe 62 Co 15 B 14 Si 9 and Fe 57 Co 10 B 20 Si 5 Nb 4 V 4 samples, which can be a result of increased absorption of water in defect during the corrosion process and expanded the capacitance interface [ 42 ]. R ct was correlated with the dissolution of Fe and resistance of chargé transfer at the double layer on the electrolyte/substrate interface [ 43 ].…”
Section: Resultsmentioning
confidence: 99%
“…Continuous measurement mode (CMX) was applied to obtain depth profiles. [ 54 ] The CMX function was expressed using a quasistatic force ( Pqstat ) in the range from 5 to 10 000 µN and the dynamic actuation force ( Pdyn ) in the range from 2 to 203.9 µN at a frequency of 85 Hz. Measurements were made at a room temperature of 24.3 °C.…”
Section: Methodsmentioning
confidence: 99%
“…After mechanical polishing, a relatively rough surface is often obtained. In order to reduce the surface roughness, strong acid solution, such as HNO 3 , HF, sulphuric acid (H 2 SO 4 ), hydrochloric acid (HCl), and prechloric acid (HClO 4 ) are used for chemical and electrochemical polishing [3,[63][64][65][66]. Therefore, these slurries cannot be applied on a large scale.…”
Section: Research Status Of Green Cmp Slurriesmentioning
confidence: 99%
“…Therefore, these slurries cannot be applied on a large scale. There is an urgent need to develop an eco-friendly CMP slurry for Ti and Ti alloys [3]. Kaushik et al developed a simple slurry composed of emulsified oil and H 2 O 2 for CMP of Ti alloy (Ti-6.3Al-1.9V-2.9Zr-2.1Mo) [31].…”
Section: Research Status Of Green Cmp Slurriesmentioning
confidence: 99%
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