2020
DOI: 10.1016/j.ijrmhm.2020.105314
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Influence of tantalum's crystal phase growth on the microstructural, electrical and mechanical properties of sputter-deposited tantalum thin film layer

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Cited by 15 publications
(7 citation statements)
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“…Radio frequency (RF) magnetron sputtering technique can be used to grow nanolayer of thin film piezoelectric oxides or nitrides at low temperature [ 55 ]. During the sputtering process, the device temperature will generally increase a little (~60 °C) due to plasma heating [ 56 ]. Therefore, ZnO and AlN can be grown at low temperature and are suitable to be integrated with flexible polymeric substrate and other low temperature CMOS processes.…”
Section: Energy Harvester For Totally Implanted Hearing Device Systemmentioning
confidence: 99%
“…Radio frequency (RF) magnetron sputtering technique can be used to grow nanolayer of thin film piezoelectric oxides or nitrides at low temperature [ 55 ]. During the sputtering process, the device temperature will generally increase a little (~60 °C) due to plasma heating [ 56 ]. Therefore, ZnO and AlN can be grown at low temperature and are suitable to be integrated with flexible polymeric substrate and other low temperature CMOS processes.…”
Section: Energy Harvester For Totally Implanted Hearing Device Systemmentioning
confidence: 99%
“…The obtainment of α-Ta film which is easily formed at high temperature deposited on Si substrate without inner-diffusion interface is very limited, partially because of the obstacle that Ta is highly reactive to the heating Si substrate 15 17 . Although it has been reported that the α-Ta film is deposited on Si substrate at RT successfully by using several strategies such as optimizing the sputtering conditions and adding under layers 18 30 . In comparison to high-temperature growth, these films are more likely to have smaller grain sizes, more grain boundaries, and more surface defects as a result of RT deposition 18 22 , which might lead to an additional dielectric loss in the superconducting quantum device 8 , 12 14 , 31 33 .…”
Section: Introductionmentioning
confidence: 99%
“…Although it has been reported that the α-Ta film is deposited on Si substrate at RT successfully by using several strategies such as optimizing the sputtering conditions and adding under layers 18 30 . In comparison to high-temperature growth, these films are more likely to have smaller grain sizes, more grain boundaries, and more surface defects as a result of RT deposition 18 22 , which might lead to an additional dielectric loss in the superconducting quantum device 8 , 12 14 , 31 33 . Besides, in these studies, the Ta-Si interface may include thicker non-superconducting underlayers 25 , 27 or metal silicides 15 17 which might form because of heating treatments used during the device fabrication flow.…”
Section: Introductionmentioning
confidence: 99%
“…The coexistence of α and β phases in films also limited their usability. [3][4][5] Therefore, deposition pure α-Ta films is critical for the studies of associated films properties. Due to the lower hardness of pure α phase deposited under different preparation methods and deposition conditions, it is necessary to focus on seeking suitable deposition conditions to obtain fine grain and higher hardness of α-Ta films.…”
Section: Introductionmentioning
confidence: 99%