“…So far, a myriad of techniques including chemical precipitation, sol–gel, hydrothermal, chemical bath deposition, spray pyrolysis, direct magnetron sputtering, and electrodeposition have been explored to develop nanostructured Co 3 O 4 materials. − Among these deposition techniques, the electrodeposition method is found to be a simple, low temperature, and cost-effective technique for growing well adhered Co 3 O 4 nanostructures with desired morphological features and composition directly onto conductive substrates without the use of binders and conductive additives. Furthermore, in electrodeposition, factors such as the composition of the electrolyte, type of electrodeposition mode, and duration of the process can be regulated to achieve the desired morphology and texture, including nanoplates, nanoflowers, nanosheets, and nanotubes. ,,,, Subsequently, previous studies have reported a variation in morphological features, microstructure, and corresponding electrochemical performance of Co 3 O 4 materials when different types of cobalt precursor salts, namely, cobalt chloride, cobalt acetate, cobalt sulfate, and cobalt nitrate, are used. ,, The growth rate of Co 3 O 4 was observed to be higher when chloride was used as compared to acetate. Thus, a novel approach will be combining two different cobalt precursors with different anion sizes to control growth rate and tune morphology to achieve high specific capacitance.…”