Influence of the Al content on mechanical properties of CVD aluminum titanium nitride coatings

Ishigaki, Takuya; Tatsuoka, Sho; Sato, Kenichi; Yanagisawa, Kenji; Yamaguchi, Kenji; Nishida, Shin Ichi

doi:10.1016/j.ijrmhm.2017.11.028

Cited by 18 publications

(10 citation statements)

References 14 publications

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“…2-c and 2-d, respectively). Although the microstructural and morphological evolution is relatively poorly described in literature, the observation of globular grains for the Ti-rich coatings is consistent with the results obtained by Ishigaki et al [17]. However, they reported the presence of this globular morphology on the full range of Al content.…”

Section: 2supporting

confidence: 90%

“…Fig. 5-A Several researchers reported the lamellae microstructure with modulation of the composition of aluminum and titanium but it was observed for coatings with higher Al contents [14,17,19]. The present results seem to mean that this particular lamellae microstructure is not dependent on the Al content.…”

Section: 2supporting

confidence: 44%

“…The present results seem to mean that this particular lamellae microstructure is not dependent on the Al content. A fcc-Al(Ti)N nanolamellae micro-structure with a modulation of the Al and Ti contents was found for coatings with an overall Al content between x = 0.62 to x = 0.82 [17,19], while an hcp-AlN/fcc-TiN modulation was found for coatings with an Al content of x = 0.95 [14]. We can expect that the observation of this lamellae microstructure in our coating having an Al content of only x = 0.08 is due to the deposition conditions used here, which are closer to the equilibrium conditions than those found in literature.…”

Section: 2mentioning

confidence: 91%

“…Relatively poor literature concerns the microstructural changes related to various Al contents in CVD thin films. Ishigaki et al have thus deposited fcc-Ti1−xAlxN coatings with various Al content at a pressure of 5 kPa without mentioning the carrier gas flow rate (H2) [17]. The proposal of this work is to investigate the microstructural and morphological changes obtained by varying x in Ti1−xAlxN coatings, at 4 kPa and low carrier gas flow rates (H2 flow rate).…”

Section: Introductionmentioning

confidence: 99%

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Deposition and characterization of (Ti, Al)N coatings deposited by thermal LPCVD in an industrial reactor

Uny

Achache

Lamri³

et al. 2019

Surface and Coatings Technology

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The increased need for protecting cutting tools has led to the development of more and more efficient coatings. Ti-Al-N is one of the most studied systems in the hard coating industry due to the high hardness and good oxidation resistance of Ti1−xAlxN coatings. The development of LPCVD processes has led to the discovery of new microstructures and morphologies. In this study, we discuss the microstructural and morphological changes caused by varying the aluminum content in films deposited by low pressure thermal CVD in an industrial reactor at low carrier gas flow and relatively high pressure (> 4 kPa). Coatings were characterized using FE-SEM, XRD and TEM analysis, revealing the growth of nanolamellae with modulated Al and Ti contents for the lowest Al containing coatings. The coatings with the highest Al contents were also found to show particular cube-shaped grains with a micromodulation of composition. Experimental Al content values are higher than the calculated one and their evolutions with the AlCl3/(AlCl3 + TiCl4) molar ratio are similar. The hardness and oxidation resistance were characterized and compared with available data in literature. Higher hardness is obtained for coatings having an Al content up to x = 0.65 and a hardness drop is found for higher Al contents. The oxidation resistance of the coatings rises continuously with an increasing Al content.

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Section: 2supporting

confidence: 90%

Section: 2supporting

confidence: 44%

Section: 2mentioning

confidence: 91%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Deposition and characterization of (Ti, Al)N coatings deposited by thermal LPCVD in an industrial reactor

Uny

Achache

Lamri³

et al. 2019

Surface and Coatings Technology

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“…However, due to the higher temperature of the CVD process, the hardness of the substrate will also decrease. At the same time, the quenching process will be required after the heat treatment, which will cause large distortion, so it is not suitable for the processing of high-precision parts [9][10][11]. Although chemical vapor deposition is a complex chemical system, it has the following advantages [6]:…”

Section: Application Of Chemical Vapor Deposition In Nano-coatingmentioning

confidence: 99%

Technical Characteristics and Wear-Resistant Mechanism of Nano Coatings: A Review

et al. 2020

Coatings

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Nano-coating has been a hot issue in recent years. It has good volume effect and surface effect, and can effectively improve the mechanical properties, corrosion resistance and wear resistance of the coatings. It is important to improve the wear resistance of the material surface. The successful preparation of nano-coatings directly affects the application of nano-coatings. Firstly, the preparation methods of conventional surface coatings such as chemical vapor deposition and physical vapor deposition, as well as the newly developed surface coating preparation methods such as sol-gel method, laser cladding and thermal spraying are reviewed in detail. The preparation principle, advantages and disadvantages and the application of each preparation method in nano-coating are analyzed and summarized. Secondly, the types of nano-coating materials are summarized and analyzed by inorganic/inorganic nanomaterial coatings and organic/inorganic nanomaterial coatings, and their research progress is summarized. Finally, the wear-resistant mechanism of nano-coatings is revealed from three aspects: grain refinement, phase transformation toughening mechanism and nano-effects. The application prospects of nano-coatings and the development potential combined with 3D technology are prospected.

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Theoretical study on gas‐phase reactions during chemical vapor deposition of Ti_xAl_1–xN from TiCl₄, AlCl₃, and NH₃

Sato,

Yamaguchi,

Koto

et al. 2024

Int J of Chemical Kinetics

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Fcc‐TixAl1–xN (TiAlN) coatings synthesized via chemical vapor deposition (CVD) reduce cutting tool wear. Although CVD conditions reportedly influence coating quality, no quantitative guidelines are yet available. To quantitatively study the film‐forming mechanism of TiAlN CVD, the gas composition over the surface must be known. Therefore, we developed a gas‐phase elementary reaction model for TiAlN CVD derived from TiCl4/AlCl3/NH3. First, we constructed a novel thermodynamic dataset including molecules that contained both Ti and Al, and calculated the equilibrium composition. Thermal equilibrium calculations in the gas phase showed that the most stable species were AlCl3 and TiCl3 rather than TiCl4. An elementary reaction model was constructed based on the kinetics of the gas‐phase species that were generated. Kinetic analysis revealed that gas‐phase reactions were largely absent under our reactor conditions. The thermal equilibrium calculations indicated that TiCl4 may have given rise to TiCl3. Thus, other reaction pathways of TiCl4 to TiCl3 were explored. We calculated the reaction rate constants of 12 reactions of Ti species and added them to the model, which revealed that TiCl4 decomposed to TiCl3 via TiCl3NH2. Under our conditions, TiCl4 and TiCl3NH2 are the major Ti species and AlCl3 and AlCl2NH2 are the major Al species, which suggests that some of these species may form films. Unlike in the earlier reaction model, NH2 and H radicals were produced, which may have contributed to the surface reactions. For reactors with large Surface/Volume ratio of reactor, the effects of gas‐phase reactions should be considered. Our reaction model enables estimation of the partial pressures of reactor gas species and will therefore aid study of the TiAlN deposition mechanism.

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Influence of the Al content on mechanical properties of CVD aluminum titanium nitride coatings

Cited by 18 publications

References 14 publications

Deposition and characterization of (Ti, Al)N coatings deposited by thermal LPCVD in an industrial reactor

Deposition and characterization of (Ti, Al)N coatings deposited by thermal LPCVD in an industrial reactor

Technical Characteristics and Wear-Resistant Mechanism of Nano Coatings: A Review

Theoretical study on gas‐phase reactions during chemical vapor deposition of Ti_xAl_1–xN from TiCl₄, AlCl₃, and NH₃

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Influence of the Al content on mechanical properties of CVD aluminum titanium nitride coatings

Cited by 18 publications

References 14 publications

Deposition and characterization of (Ti, Al)N coatings deposited by thermal LPCVD in an industrial reactor

Deposition and characterization of (Ti, Al)N coatings deposited by thermal LPCVD in an industrial reactor

Technical Characteristics and Wear-Resistant Mechanism of Nano Coatings: A Review

Theoretical study on gas‐phase reactions during chemical vapor deposition of TixAl1–xN from TiCl4, AlCl3, and NH3

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Product

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Theoretical study on gas‐phase reactions during chemical vapor deposition of Ti_xAl_1–xN from TiCl₄, AlCl₃, and NH₃