Influence of the deposition parameters on the composition, structure and X-ray photoelectron spectroscopy spectra of TiN films

Kuznetsov, M. V.; Zhuravlev, M. V.; Shalayeva, E.V.; Gubanov, V. A.

doi:10.1016/0040-6090(92)90692-5

Cited by 35 publications

(4 citation statements)

References 19 publications

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“…They are very similar to those observed in the literature [15][16][17][18][19]. The first doublet characterized by the binding energy of the Ti 2p 3/2 and Ti 2p 1/2 levels at 455.01 eV and 460.85 eV, respectively, corresponds to Ti in TiN [16,[20][21][22]. The second doublet identified by its binding energy Ti 2p 3/2 , 456.62 eV and Ti 2p 1/2 , 462.23 eV, can be associated with the presence of oxynitride species of the type TiO x N y [17].…”

Section: Xps Analysissupporting

confidence: 88%

TiN–Fe nanocomposite thin films deposited by reactive magnetron sputtering

Zerkout

Achour

Tabet

2007

J. Phys. D: Appl. Phys.

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TiN–Fe films with various iron concentrations were deposited on Si and NaCl single-crystal substrates by direct current reactive magnetron sputtering. The structure and chemical composition of the films were examined by x-ray diffraction (XRD), high resolution transmission electron microscopy (HRTEM), energy-dispersive x-ray and x-ray photoelectron spectroscopy (XPS). The effects of Fe addition on the structural, mechanical and magnetic properties of TiN films were studied. XRD and HRTEM revealed for TiN–Fe a cubic B-1 structure while no sign of an iron phase was observed. It was found that the lattice parameter and the grain size decreased with an increase in the Fe/Ti atomic ratio. At Fe/Ti = 0.2, the XRD revealed a change in the preferential orientation from (1 1 1) to (2 0 0) with a tendency of line broadening as the iron concentration increased. The Fe 2p core level peak of XPS indicates that the greater part of Fe atoms in TiN–Fe films exists as free pure metallic iron while the lesser part was in the form of iron oxide. Film annealing at 500 and 600 °C led to iron precipitation of the α-Fe phase indicating that below 500 °C Fe–TiN, films can be considered as nanocomposites materials, as confirmed by nanoindentation measurements and HRTEM observations.

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Section: Xps Analysissupporting

confidence: 88%

TiN–Fe nanocomposite thin films deposited by reactive magnetron sputtering

Zerkout

Achour

Tabet

2007

J. Phys. D: Appl. Phys.

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“…The N 1s peak 2 has previously been assigned to TiN x with a binding energy range of 397.1-397.5 eV, depending on the N/Ti ratio (56,57). Peak 2 constitutes the majority of the N 1s region in spectra of NH 3 /NH 3 and NH 3 (30)/NH 3 films.…”

Section: Discussionmentioning

confidence: 99%

Controlled Nitrogen Doping and Film Colorimetrics in Porous TiO₂ Materials Using Plasma Processing

Pulsipher

Martin

Fisher

2010

ACS Appl. Mater. Interfaces

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Nitrogen doping of TiO(2) films (N:TiO(2)) has been shown to improve the visible-light sensitivity of TiO(2), thereby increasing the performance of both photovoltaic and photocatalytic devices. Inductively coupled rf plasmas containing a wide range of nitrogen precursors were used to create nitrogen-doped TiO(2) films. These treatments resulted in anatase-phased materials with as high as 34% nitrogen content. As monitored with high-resolution X-ray photoelectron spectroscopy spectra, the nitrogen binding environments within the films were controlled by varying the plasma processing conditions. XPS peak assignments for multiple N 1s binding environments were made based on high resolution Ti 2p and O 1s XPS spectra, Fourier transform infrared spectroscopy (FTIR) data, and literature N 1s XPS peak assignments. The N:TiO(2) films produced via plasma treatments displayed colors ranging from gray to brown to blue to black, paralleling the N/Ti ratios of the films. Three possible mechanisms to explain the color changes in these materials are presented.

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“…Increasing etching time (and depth), the spectrum is shifted to lower binding energies, changing to a near pure Ti spectrum. It indicates that for low N/Ti ratio (below 0.3), the N is in solid solution with Ti [39].…”

Section: Resultsmentioning

confidence: 99%

Grid-assisted magnetron sputtering deposition of nitrogen graded TiN thin films

et al. 2020

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Titanium Nitride (TiN) films were obtained using the grid-assisted magnetron sputtering deposition technique on Al substrates in two conditions: under constant and variable nitrogen concentration along the thin solid film thickness. The formation of a film with variable N concentration (herein referred as graded film) was confirmed using energy filtered transmission electron microscopy, X-ray photoelectron spectroscopy and grazing incidence X-ray diffraction. The TiN thin films microstructures were also analysed using scanning and transmission electron microscopies (SEM and TEM). The viability of synthesizing TiN thin films with variable N concentration is herein proposed as an alternative method for tailoring the properties of such functional coating materials.

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Influence of the deposition parameters on the composition, structure and X-ray photoelectron spectroscopy spectra of TiN films

Cited by 35 publications

References 19 publications

TiN–Fe nanocomposite thin films deposited by reactive magnetron sputtering

TiN–Fe nanocomposite thin films deposited by reactive magnetron sputtering

Controlled Nitrogen Doping and Film Colorimetrics in Porous TiO₂ Materials Using Plasma Processing

Grid-assisted magnetron sputtering deposition of nitrogen graded TiN thin films

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Influence of the deposition parameters on the composition, structure and X-ray photoelectron spectroscopy spectra of TiN films

Cited by 35 publications

References 19 publications

TiN–Fe nanocomposite thin films deposited by reactive magnetron sputtering

TiN–Fe nanocomposite thin films deposited by reactive magnetron sputtering

Controlled Nitrogen Doping and Film Colorimetrics in Porous TiO2 Materials Using Plasma Processing

Grid-assisted magnetron sputtering deposition of nitrogen graded TiN thin films

Contact Info

Product

Resources

About

Controlled Nitrogen Doping and Film Colorimetrics in Porous TiO₂ Materials Using Plasma Processing