Two sets of ͓Co 0.74 Si 0.26 ͑5 nm͒ / Si͑s͔͒ n amorphous films were prepared by magnetron sputtering: one in the form of multilayers with the Si spacer thickness s fixed at 3 nm, and the number n of periods varying from 1 to 10 and the other with only two periods and s varying from 3 to 24 nm ͑trilayers͒. In both sets, the Co 0.74 Si 0.26 layer thickness t was fixed at 5 nm. All the samples except the one with s = 24 nm manifest antiferromagnetic coupling. Their magnetic properties at room temperature were probed using the magnetooptical transverse Kerr effect ͑MOTKE͒ and ferromagnetic resonance ͑FMR͒. The relative increase in the saturation magnetization M s ͑for trilayers, relative to a structure with s = 24 nm; for multilayers, relative to the single-layer structure͒ determined from the FMR measurements was compared with the exchange coupling strength H J AF obtained from the MOTKE studies. The dependences of H J AF and M s on n and s were found to be very similar to each other. Possible mechanisms of this similarity are discussed.