Influence of the oxidation in the metal silicide/Si3N4 interfaces on the etching profile

Kim, D. W.; Kim, H. S.; Ahn, Seungjoon; Kim, J. H.; Kim, Y. J.; K., K.

doi:10.1016/j.mee.2004.07.068

Microelectronic Engineering

2005

DOI: 10.1016/j.mee.2004.07.068

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Influence of the oxidation in the metal silicide/Si3N4 interfaces on the etching profile

D. W. Kim

H. S. Kim

Seungjoon Ahn

et al.

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Influence of the oxidation in the metal silicide/Si3N4 interfaces on the etching profile

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References 20 publications

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