2015
DOI: 10.1063/1.4933217
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Influence of the oxidation state of SrTiO3 plasmas for stoichiometric growth of pulsed laser deposition films identified by laser induced fluorescence

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Cited by 29 publications
(22 citation statements)
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“…Thereby the measurements in the YBO plasma show remarkable differences in comparison to oxidation studies done on STO 17 and LAO. 18 To better describe the difference to those observations, in the oxidation studies of Ti and Al, we recall three distinct features that can be found as a characteristic for oxidation of a plasma species by O 2 from the background gas. First, oxidation should be largely absent from the plasma for ablation in pure Ar, only appearing when oxygen is added to the background gas.…”
Section: Apl Mater 4 126102 (2016)mentioning
confidence: 99%
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“…Thereby the measurements in the YBO plasma show remarkable differences in comparison to oxidation studies done on STO 17 and LAO. 18 To better describe the difference to those observations, in the oxidation studies of Ti and Al, we recall three distinct features that can be found as a characteristic for oxidation of a plasma species by O 2 from the background gas. First, oxidation should be largely absent from the plasma for ablation in pure Ar, only appearing when oxygen is added to the background gas.…”
Section: Apl Mater 4 126102 (2016)mentioning
confidence: 99%
“…However, already at 10% O 2 a significant amount of YO is available; yet no YBO appears to grow. In previous research, 17,18 we found that the oxidation state in which the plasma constituents arrive at the substrate can influence the stoichiometry of the film growth; yet, film growth would still take place. In other research where the background gas is modified, either its pressure or its composition, to investigate its influence on the film growth 33,34 results.…”
Section: Apl Mater 4 126102 (2016)mentioning
confidence: 99%
See 1 more Smart Citation
“…Here, we could not identify a clear trend of the film composition with the target ablation history. To address the issue of preferential ablation in more detail, in-situ insights into the plume composition and the ablation dynamics would be required, 32 but which lie beyond the scope of this paper. To resolve this nonstoichiometry issue, we employed a pure NdNiO 3 phase target for the growth of a new NNO thin film series as discussed in the next section.…”
Section: -8 Preziosi Et Almentioning
confidence: 99%
“…These measurements revealed oxidation of the transition metal species in a relatively narrow pressure window, typically from 10 −2 to 10 −1 mbar. With this insight, a relation was made to the type of growth mechanism of thin films and the arrival of certain oxidation states of these species [44]. For SrTiO 3 , it was concluded that sticking and surface diffusivity leading to perfect layer-by-layer growth and stoichiometric (Sr:Ti = 1:1) films are connected to the arrival of fully oxidised Ti 4+ species.…”
Section: Growth Kineticsmentioning
confidence: 99%