Certain hydrophobic dopants in surfactant solutions cause massive "supramicellar assemblies" (SAs) to form near the critical micelle concentration (CMC), characterized by a light-scattering peak (LSP). The SAs are large, dynamic, metastable nanostructures composed of surfactant/ dopant. Here, a water-soluble polymer, poly(vinylpyrollidone) (PVP) suppresses SA formation in sodium dodecyl sulfate (SDS) solutions doped with dodecanol, but increases solution instability. Binding of SDS to PVP is stronger than micellization in the LSP regime, refl ected in a decreased SA population and a dramatic reduction and inversion of Rayleigh scattering I R as [PVP] increases, since SAs are much more massive than PVP/SDS association structures. Above the LSP regime, SAs no longer exist and thus I R must re-establish its order, increasing with increasing [PVP]. This causes a cross-over in I R vs [SDS] with an "iso-scattering point," where I R converges at a specifi c [SDS]. Weak LSP suppression is found using dodecyl tri ethyl ammonium bromide (DTAB). Poly(ethylene oxide) (PEO)'s effect is small compared with PVP. electrically charged when SDS binds to it and shows polyelectrolyte-like behavior.To the authors' knowledge, few reports have considered the effect of polymers on the interaction between surfactants and dopants. [18][19][20] Our recent report [ 21 ] shows that certain hydrophobic dopants and surfactants in solution lead to formation of large metastable "supramicellar assemblies" (SAs) in a concentration regime from near the critical micelle concentration (CMC) down to the dopant's solubility limit; i.e., the surfactant micelles do not merely release their hydrophobic payload the CMC, but remain associated with it. This property may help understanding of dispersant, e.g., those used in oil spills, where it is often thought that the surfactant will release the oil below the CMC and re-coalesce, diminishing the effectiveness of the dispersant. The SA shows that is not necessarily the case. Here, it was found that adding PVP to solutions containing SAs can completely suppress the formation of SAs from near the CMC down to the CAC. Many industrial and medical applications involve the use of self-assembly of surfactants, which makes the study of the polymeric