Influence of the substrate bias potential on the properties of ta-C coatings deposited using Venetian blind plasma filter

Zavaleyev, V.; Walkowicz, J.

doi:10.1016/j.tsf.2014.11.074

Cited by 21 publications

(5 citation statements)

References 40 publications

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“…It is clear from Figure 4 a that increasing the pulse length of the bias voltage leads to an increase in both ta-C hardness and Young’s modulus, similar to observations in the literature working with different bias voltage levels [ 27 ]. Obviously, not only the level but also the duration of applied bias voltage has a significant effect on hardness and Young’s modulus of the ta-C film.…”

Section: Resultssupporting

confidence: 85%

Effect of Energy and Temperature on Tetrahedral Amorphous Carbon Coatings Deposited by Filtered Laser-Arc

et al. 2021

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In this study, both the plasma process of filtered laser-arc evaporation and the resulting properties of tetrahedral amorphous carbon coatings are investigated. The energy distribution of the plasma species and the arc spot dynamics during the arc evaporation are described. Different ta-C coatings are synthesized by varying the bias pulse time and temperature during deposition. An increase in hardness was observed with the increased overlapping of the bias and arc pulse times. External heating resulted in a significant loss of hardness. A strong discrepancy between the in-plane properties and the properties in the film normal direction was detected specifically for a medium temperature of 120 °C during deposition. Investigations using electron microscopy revealed that this strong anisotropy can be explained by the formation of nanocrystalline graphite areas and their orientation toward the film’s normal direction. This novel coating type differs from standard amorphous a-C and ta-C coatings and offers new possibilities for superior mechanical behavior due to its combination of a high hardness and low in-plane Young’s Modulus.

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Section: Resultssupporting

confidence: 85%

Effect of Energy and Temperature on Tetrahedral Amorphous Carbon Coatings Deposited by Filtered Laser-Arc

et al. 2021

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“…When the ion energy is greater than 100 eV, the extra ion energy can cause local structure and stress relaxation of atoms inside the film, which promotes the transformation of some sp 3 hybrid bonds into sp 2 hybrid bonds, resulting in a decrease in the content of sp 3 hybrid bonds in the film. Therefore, in previous studies [40][41][42], it is generally accepted that the highest sp 3 fractions are formed by C + ions with ion energy around 100 eV. However, it can be concluded from this work that the properties of ta-C films depend not only on the energy of ions but also on the value of plasma density.…”

Section: Resultsmentioning

confidence: 63%

Plasma diagnosis of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition

Wang

Zhang

Lü

et al. 2023

Plasma Sci. Technol.

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Filtered cathodic vacuum arc (FCVA) is regarded as an important technique for the synthesis of tetrahedral amorphous carbon (ta-C) films due to its high ionization rate, high deposition rate and effective filtration of macroparticles. Probing plasma characteristics of arc discharge contributed to understanding the deposition mechanism of ta-C films in microscopic nature. This work focuses on the plasma diagnosis of a filtered cathodic vacuum arc discharge using a Langmuir dual-probe system with a discrete Fourier transform smoothing method. During the ta-C film deposition, the arc current of graphite cathodes and deposition pressure varied from 30 to 90 A and from 0.3 to 0.9 Pa, respectively. The plasma density increases with arc current but decreases with pressure. The carbon plasma density generated by the arc discharge is around the order of 1010 cm-3. The electron temperature varies in the range of 2⁓3.5 eV. As the number of cathodic arc sources and the current of the focused magnetic coil (FM) increases, the plasma density increases. The ratio of the intensity of D- Raman peak and G- Raman peak (ID/IG) of the ta-C films increases with increasing plasma density, resulting in a decrease in film hardness. It is indicated that the mechanical properties of ta-C films depend not only on the ion energy but also on the carbon plasma density.

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“…Zavaleyev et al reported that the surface roughness of ta-C films deposited by a filtered cathode vacuum arc method changed depending on the incident ion energy. This can be explained by a sub-plantation model 9) , that is, in a low energy area, incident ions negligibly diffuse under the surface of a ta-C film, resulting in the formation of a large sp 2 cluster and, accordingly, a higher surface roughness. In our case, 12 C atoms were sputtered to a substrate with lower energy than 13 C and resulted in Ra of the a-12 C film being higher than that of the a-13 C film.…”

Section: Resultsmentioning

confidence: 99%

Isotopic influence on amorphous carbon films

Suzuki

Fuji

Ohtake

et al. 2015

Trans. Mat. Res. Soc. Japan

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Amorphous carbon (a-12 C) and amorphous isotopic carbon (a-13 C) films were deposited from carbon and 13 C targets, respectively to investigate isotopic effects on the electronic properties of amorphous carbon films. The 13 C target was obtained by sintering 13 C charcoal. The structure of the films was evaluated by Raman spectroscopy. The density of paramagnetic defects was evaluated by electon spin resonance, and ultraviolet-visible spectroscopy was carried out to determine the optical band gap of the films. There were no significant differences between the graphite structures of a-12 C and a-13 C films. On the other hand, the defect density of the a-13 C film (1.1×10 20 cm -3 ) was more than 10 times higher than that of the a-12 C film (1.0×10 19 cm -3 ) and the Tauc gap of the a-13 C film (1.9 eV) was lower than that of the a-12 C film (2.1 eV). These results indicated that 13 C affects the electronic properties of amorphous carbon films.

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Influence of the substrate bias potential on the properties of ta-C coatings deposited using Venetian blind plasma filter

Cited by 21 publications

References 40 publications

Effect of Energy and Temperature on Tetrahedral Amorphous Carbon Coatings Deposited by Filtered Laser-Arc

Effect of Energy and Temperature on Tetrahedral Amorphous Carbon Coatings Deposited by Filtered Laser-Arc

Plasma diagnosis of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition

Isotopic influence on amorphous carbon films

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