Influence of thermal annealing and of the substrate on sputter-deposited thin films from EUROFER97 on tungsten

Pitthan, E.; Tran, Tuan T.; Moldarev, Dmitrii; Rubel, M.; Primetzhofer, Daniel

doi:10.1016/j.nme.2023.101449

Cited by 2 publications

(1 citation statement)

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“…A 3 mm thick tungsten target and a 1 mm thick EUROFER97 target were used to synthesize sputter-deposited thin films of EUROFER97 on tungsten on silicon and carbon substrates. Due to the ferromagnetic characteristic of EUROFER97, the thickness of its target had to be minimized to 1 mm to alleviate interference with the required magnetic field of the magnetron cathode to maintain the argon plasma [25,26]. The typical distance between the sputtering target and the substrate in this system is about 15 cm and is adjustable by ±2.5 cm.…”

Section: Sample Preparation and Characterisationmentioning

confidence: 99%

Sputter-deposition of ultra-thin film stacks from EUROFER97 and tungsten: characterisation and interaction with low-energy D and He ions

Shams-Latifi,

Pitthan,

Tran

et al. 2024

Mater. Res. Express

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We have sputter-deposited stacks of ultrathin layers from EUROFER97 and tungsten on silicon substrates. Ion beam analysis techniques are used for composition characterisation and microscopy methods are employed for structural examination. The films are subsequently studied by time-of-flight low-energy ion scattering (ToF-LEIS) for primary 10 keV He+ and 8 keV D+ ions to demonstrate an approach of providing accurate and precise experimental reference electronic stopping cross-sections for fusion-relevant steels. The energy-converted ToF-LEIS spectra are compared to Monte-Carlo simulations for quantitative analysis explicitly considering the influence of plural and multiple scattering. We discuss the deduced stopping cross-sections of EUROFER97 in comparison to predictions by SRIM using Bragg’s rule of stopping power additivity.

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Section: Sample Preparation and Characterisationmentioning

confidence: 99%