Influence of VPT Treatment on Microscopic Distribution of Trace Metal Contaminants and its Effect on TXRF Measurement

Ohno, Rikiichi; Saga, Koichiro

doi:10.4028/www.scientific.net/ssp.282.309

SSP

2018

DOI: 10.4028/www.scientific.net/ssp.282.309

|View full text |Cite

Influence of VPT Treatment on Microscopic Distribution of Trace Metal Contaminants and its Effect on TXRF Measurement

Rikiichi Ohno

Koichiro Saga

Abstract: We have found that to the detection sensitivity of Total reflection X-ray fluorescent spectrometry (TXRF), the total volume of trace particles generated by vapor phase treatment (VPT) must be increased and metal atoms need to be included in the particles. The detection sensitivity for Cu is enhanced by assisting Cu ionization in the liquid drops condensed form the vapor. We consider that since incident and reflected X-rays resonate 30nm from the surface, the total reflection intensity of metals included in the… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

Supporting

Mentioning

Contrasting

Year Published

2020

Publication Types

Select...

Article1

Relationship

Self Cite0

Independent1

Authors

Journals

Cited by 1 publication

References 5 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

Study of nano particle stripping and composition inspection on wafer surface

Li-tuo¹,

Wang²,

Yu³

et al. 2020

Acta Phys. Sin.

View full text Add to dashboard Cite

Nano-scale particle stripping and inspection on silicon wafer are critical issues for Integrated Circuit(IC) manufacture industry. As more new materials are used in IC manufacture, not only particle itself but also its composition should be inspected. Particles are mainly adhered by the van der waals force. One of potential particle desorption method is laser cleaning which is environment friendly. However, the mechanism of laser cleaning is not clear and more studies should be done for laser ablation. In this paper, the kinetic process of nano particle on silicon wafer induced by nanosecond pulsed laser as well as the on-line detection method of particle composition were studied. A potential method of nano particle dynamic analysis and particle composition inspection were presented. A dual nanosecond pulse laser system both wavelengths at 532 nm is designed in which one laser pumps the particles away from wafer surface almost without damage, the other laser breakdowns the particles in air above the wafer surface to obtain the emission lines of the contaminated particles of 300 nm Cu by a spectroscopy with CCD. Particle motion trail in z direction was observed after laser cleaning by analyzing particle spectral features. The particle dynamic model after stripping was established in which the resistance of air collision and gravity were included. And the model parameters were obtained by calculation using experimental results. The initial velocity of particle at the end of laser pulse and the average acceleration during laser interaction were calculated which were 7.6 m/s and 7.6 × 108 m/s2 respectively. The sensitivity of the dual laser system was evaluated which was between 2.1 × 1013 to 5.1 × 1013 atoms/cm2. As result, it is found that the gravity of the particle should not be ignored and the velocity divergence between different stripping particles is existed. The study not only provides a methodology for the study of laser-induced removal of nano particles on the wafer surface and laser induced nano particle dynamics, but also provides a potential method for the inspection of particle composition and pollution source monitoring on line in integrated circuit manufacture process. As the results were not the optimum one and further study should be done in which a better laser power density should be used.

show abstract

Study of nano particle stripping and composition inspection on wafer surface

Li-tuo¹,

Wang²,

Yu³

et al. 2020

Acta Phys. Sin.

View full text Add to dashboard Cite

show abstract

scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.

Contact Info

customersupport@researchsolutions.com

10624 S. Eastern Ave., Ste. A-614

Henderson, NV 89052, USA

This site is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.

Blog Terms and Conditions API Terms Privacy Policy Contact Cookie Preferences Do Not Sell or Share My Personal Information

Made with 💙 for researchers

Part of the Research Solutions Family.

Influence of VPT Treatment on Microscopic Distribution of Trace Metal Contaminants and its Effect on TXRF Measurement

Cited by 1 publication

References 5 publications

Study of nano particle stripping and composition inspection on wafer surface

Study of nano particle stripping and composition inspection on wafer surface

Contact Info

Product

Resources

About