Infrared multiphoton dissociation of vinyltrifluorosilane

Koshliakov, P.V.; Gorelik, Sergey; Чесноков, Е. Н.; Vorobiev, A.V.; Petrov, A. K.

doi:10.1007/s00340-006-2269-z

Cited by 7 publications

(3 citation statements)

References 27 publications

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“…Para ello se requiere encontrar el compuesto precursor adecuado. La DMFIR con láseres de CO 2 TEA ha sido aplicada a la determinación de la selectividad isotópica de compuestos que contienen silicio utilizando SiF 3 Cl (5) , SiF 2 H 2 (6) , SiF 3 C 2 H 3 (7) , SiF 3 C 6 H 5 (8) , SiF 3 CH 3 (8) , SiF 3 CH 2 Cl (9) , SiF 3 C 2 H 3 Cl 2 (10,11) y Si 2 F 6 (12−19) como moléculas de trabajo. Los resultados más promisorios han sido alcanzados con Si 2 F 6 (12,13) .…”

Section: -Introduccionunclassified

ISOTOPIC SELECTIVITY IN THE INFRARED MULTIPLE-PHOTON DISSOCIATION OF SiF4

Alcaraz

Codnia²,

Azcárate³

2010

AnAFA

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4 μm de un láser de CO 2 TEA. Se irradiaron mezclas de SiF 4 e H 2 con la línea 9P(36), cuasiresonante con la frecuencia vibracional del modo ν 3 de 28 SiF 4 , y con líneas corridas hacia el rojo y el azul con respecto de ésta. La fracción disociada por pulso se determinó por espectrometría FTIR siguiendo la desaparición de la molécula precursora, SiF 4 , y la aparición del producto, SiF 3 H. Los factores de enriquecimiento 29,30 α en el reactivo (SiF 4) y 29,30 β en el producto (SiF 3 H) se determinaron mediante espectrometría de masas. Palabras Claves: silicio, separación isotópica, láser. The isotopic selectivity of the IRMPD of SiF 4 following irradiation with different emission lines of the 9.4 μm band of a TEA CO 2 laser has been studied. The 9P(36) line is quasi-resonant with the vibrational frequency of the ν 3 mode of 28 SiF 4. Mixtures of SiF 4 and H 2 have been irradiated with the rotational lines 9P(32)-9P(42). The fraction of molecules dissociated per pulse was determined by FTIR spectrometry following the disappearance of the working molecule, SiF 4 , and the appearance of the product, SiF 3 H. The enrichment factors both in the reactant (SiF 4), 29,30 α, and in the product (SiF 3 H), 29,30 β, have been determined by mass spectrometry.

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Section: -Introduccionunclassified

ISOTOPIC SELECTIVITY IN THE INFRARED MULTIPLE-PHOTON DISSOCIATION OF SiF4

Alcaraz

Codnia²,

Azcárate³

2010

AnAFA

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“…Silicon isotope-selective MPD of compounds containing single silicon atoms, such as SiH 2 F 2 (15), SiF 3 C 6 H 5 (16)(17)(18), SiF 3 CH 3 (19,20), SiF 3 CHCH 2 (21) and Si(OCH 3 ) 4 (22) was studied previously. The maximum isotope selectivities reached for the MPD of these molecules were found to be lower than that for Si 2 F 6 .…”

Section: Introductionmentioning

confidence: 99%

“…The maximum isotope selectivities reached for the MPD of these molecules were found to be lower than that for Si 2 F 6 . From the analysis of spectroscopic and kinetic characteristics of the MPD of these molecules, one can conclude that the main reason for the higher efficiency of the Si 2 F 6 MPD is its low dissociation threshold (188 kJ mol )1 [10]) compared to the molecules studied elsewhere (around 420 kJ mol )1 [14][15][16][17][18][19][20][21][22]). Therefore, the further search of the compounds should be limited to those containing only one silicon atom, and possessing a relatively low dissociation threshold.…”

Section: Introductionmentioning

confidence: 99%

Infrared Multiple Photon Dissociation of Chloromethyltrifluorosilane

Koshlyakov

Gorelik

Чесноков

et al. 2009

Photochem & Photobiology

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Infrared multiphoton absorption and dissociation of chloromethyltrifluorosilane molecules under the action of pulsed transversely excited atmospheric pressure CO2 laser were experimentally studied. Dissociation products were analyzed. The dissociation proceeds via chlorine atom transfer from carbon to silicone. High degrees of silicon isotope separation were achieved. The presence of alpha-chlorine atom in a silicon organic compound brings about a significant improvement in multiple photon dissociation characteristics and an essential increase in isotopic selectivity.

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