“…In the electronic industry, as the veracity of using semiconductor materials intensifies -so does the compulsion of employing reliable and reproducible methods for appraising their distinctive qualities. In assessing the nature of defects and degree of crystallinity, many experimental techniques have been employed in the past, such as the Fourier transform infrared (FTIR) reflectivity and transmission [9,10], Raman scattering (RS) [8], photoluminescence (PL) [11], synchrotron X-ray diffraction (S-XRD) topography [1][2][3], and deep level transient spectroscopy (DLTS) [12], etc. In addition, the spectroscopic ellipsometry (SE) is perceived as an equally valuable tool for appraising the optical constants of semiconductor materials and evaluating the epifilm thickness [13].…”