1982
DOI: 10.1016/0021-9797(82)90046-7
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Infrared study of the sorption of HSiCl3 on silica and the stability of the chemisorbed layers

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1983
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Cited by 23 publications
(11 citation statements)
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“…Trichlorosilane (HSiCl 3 ), methyldichlorosilane (HSiCl 2 CH 3 ), or dimethylchlorosilane [HSiCl­(CH 3 ) 2 ] have been used for that purpose (Scheme ). The adsorption is usually performed in the gas phase and proceeds by exchange with the hydroxyl groups of silica. The number of ligands exchanged with hydroxyl groups depends on the structure of the silane, i.e., the number and type of ligands (Scheme b), and the hydride-related stretching vibration is displaced accordingly .…”
Section: Supported Metal Hydrides Prepared Via Surface Organometallic...mentioning
confidence: 99%
“…Trichlorosilane (HSiCl 3 ), methyldichlorosilane (HSiCl 2 CH 3 ), or dimethylchlorosilane [HSiCl­(CH 3 ) 2 ] have been used for that purpose (Scheme ). The adsorption is usually performed in the gas phase and proceeds by exchange with the hydroxyl groups of silica. The number of ligands exchanged with hydroxyl groups depends on the structure of the silane, i.e., the number and type of ligands (Scheme b), and the hydride-related stretching vibration is displaced accordingly .…”
Section: Supported Metal Hydrides Prepared Via Surface Organometallic...mentioning
confidence: 99%
“…Similar surface species were also observed upon chemisorption of trichlorosilane on silica, followed by a vacuum treatment at 650 °C . Later work on the water-vapor treatment of Si–Cl species and pyrolysis of trimethylsiloxylated silica also describes the generation of surfaces, which differ by the structure of the reactive groups. These species activate some small molecules, e.g., dioxygen, methane, and carbon monoxide, as well as initiate polymerization of olefins. ,, In addition to surface chemistry studies, the role of reactive species was recognized within the field of microelectronics. The formation of defects in a silica gate within a metal oxide semiconductor causes dielectric breakdown and 1/f noise …”
Section: Introductionmentioning
confidence: 78%
“…The chemical structure of PHPS is shown in Scheme . PHPS is easily converted into silica at low temperatures under steam unlike other silica precursors, such as orthosilicate and polyhedral oligomeric silsesquioxanes . PHPS is soluble in many organic solvents such as chloroform, toluene, and xylene.…”
Section: Introductionmentioning
confidence: 99%