“…For this purpose, an n-type GaN window layer has been shown to improve the open-circuit voltage and fill factor of an In x Ga 1Àx N solar cell. [76] A variety of techniques has been used to grow In x Ga 1Àx N/GaN nanocolumnar structures: radio-frequency molecular beam epitaxy (MBE), [82][83][84] plasmaassisted MBE, [85] CVD, [81,86] hydride vapor phase epitaxy (HVPE), [80,87] and plasma-assisted evaporation. [30,88,89] Regardless of the deposition technique, the growth of In x Ga 1Àx N nanocolumns is most dependent on three key deposition parameters: temperature, growth rate, and the III-V ratio.…”