2009
DOI: 10.1016/j.apsusc.2009.02.065
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InGaN nanorod arrays grown by molecular beam epitaxy: Growth mechanism structural and optical properties

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Cited by 19 publications
(15 citation statements)
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“…While most In x Ga 1Àx N columnar growth is self-catalyzed by the gallium atoms, some authors report the need for another metal catalyst such as gold to initiate nanocolumn growth. [86] A similar but slightly different growth mechanism for In x Ga 1Àx N nanorods was also reported by Wu et al [82] This nanorod growth was observed in situ using a high-temperature transmission electron microscope (TEM). In this process, In x Ga 1Àx N is first grown epitaxially until the critical layer is reached.…”
Section: Advanced Microstructures For In X Ga 1àx N Pvsupporting
confidence: 66%
See 1 more Smart Citation
“…While most In x Ga 1Àx N columnar growth is self-catalyzed by the gallium atoms, some authors report the need for another metal catalyst such as gold to initiate nanocolumn growth. [86] A similar but slightly different growth mechanism for In x Ga 1Àx N nanorods was also reported by Wu et al [82] This nanorod growth was observed in situ using a high-temperature transmission electron microscope (TEM). In this process, In x Ga 1Àx N is first grown epitaxially until the critical layer is reached.…”
Section: Advanced Microstructures For In X Ga 1àx N Pvsupporting
confidence: 66%
“…For this purpose, an n-type GaN window layer has been shown to improve the open-circuit voltage and fill factor of an In x Ga 1Àx N solar cell. [76] A variety of techniques has been used to grow In x Ga 1Àx N/GaN nanocolumnar structures: radio-frequency molecular beam epitaxy (MBE), [82][83][84] plasmaassisted MBE, [85] CVD, [81,86] hydride vapor phase epitaxy (HVPE), [80,87] and plasma-assisted evaporation. [30,88,89] Regardless of the deposition technique, the growth of In x Ga 1Àx N nanocolumns is most dependent on three key deposition parameters: temperature, growth rate, and the III-V ratio.…”
Section: Advanced Microstructures For In X Ga 1àx N Pvmentioning
confidence: 99%
“…Many publications have already reported on the growth of homoepitaxial III-nitride NWs by plasma assisted molecular beam epitaxy ͑PAMBE͒, [10][11][12][13][14][15][16][17][18][19][20] including InGaN NWs on Si substrates. 21,22 However, to exploit the whole range of optoelectronic devices compatible with a NW design, the possibility to realize axial as well as radial hetero-and quantum structures is essential. So far these efforts have focused on introducing thin quantum disks into the NWs ͑Refs.…”
Section: Structural and Optical Properties Of Ingan-gan Nanowire Hetementioning
confidence: 99%
“…[5][6][7][8][9][10][11][12][13] To date, however, there have been only a few reports on the MBE growth of ternary InGaN nanowires (see Refs. 7,14 for examples). In this work, the MBE growth and characterization of InGaN wires with high indium compositions is reported.…”
mentioning
confidence: 99%