InGaP/GaAs/InGaAs doped-channel field-effect transistor using camel-like gate structure

Abstract

In this article, we first fabricate and demonstrate the InGaP/GaAs camel-like gate field-effect transistor with InGaAs pseudomorphic heavy-doped channel. Due to the large gate potential barrier for the use of the n + -GaAs/p + -InGaP/nGaAs camel-like gate and the thin as well as heavy doping n + -InGaAs channel layer, the effective conduction band discontinuity ('Ec) is substantially extended and a high gate turn-on voltage up to 2.0 V is obtained. The device exhibits a relatively broad gate voltage swing resulting from the high gate turn-on voltage. In addition, a maximum drain current of 393 mA/mm and a maximum transconductance of 96 mS/mm are measured. These results indicate that the studied device is suitable for signal amplifier and linear circuit applications.