2009
DOI: 10.1103/physrevb.80.035426
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Initial stages of nickel oxide growth on Ag(001) by pulsed laser deposition

Abstract: Submonolayers of nickel oxide films were grown on an Ag͑001͒ by pulsed laser deposition, and characterized in situ by both scanning tunneling microscopy and x-ray photoelectron spectroscopy. We observed quasitwo-dimensional growth of the film, and clearly identified several kinds of defects, such as embedded metallic Ni clusters and, notably, oxygen atoms, even while looking deeply into the substrate. These originated from Ni and O hyperthermal projectiles as well as from NiO clusters that were formed during l… Show more

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Cited by 12 publications
(7 citation statements)
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“…A widely investigated system in which such a process has been observed is the NiO/Ag(001) interface, where the deposition of NiO induces the displacement of Ag atoms from the terraces. The resulting complex interface is characterized by the presence of vacancy islands on the substrate and NiO islands embedded in the topmost layers of the Ag(001) surface [59][60][61][62][63][64][65]. Oxide islands embedded in metallic substrates have been observed also for MgO [66,67] and FeO [68] nanolayers grown on Ag(001), as well as for FeO [69] and CoO [70] films deposited on Au (111).…”
Section: Mesoscopic Morphologymentioning
confidence: 95%
“…A widely investigated system in which such a process has been observed is the NiO/Ag(001) interface, where the deposition of NiO induces the displacement of Ag atoms from the terraces. The resulting complex interface is characterized by the presence of vacancy islands on the substrate and NiO islands embedded in the topmost layers of the Ag(001) surface [59][60][61][62][63][64][65]. Oxide islands embedded in metallic substrates have been observed also for MgO [66,67] and FeO [68] nanolayers grown on Ag(001), as well as for FeO [69] and CoO [70] films deposited on Au (111).…”
Section: Mesoscopic Morphologymentioning
confidence: 95%
“…7 inset). The deposited volume per pulse and per unit surface is V = 7.8 × 10 10 nm 3 /cm 2 and by using V C = 0.033 nm 3 as the mean cluster volume (estimated from STM image analysis), R is obtained: 12 cluster pulse cm 2 .…”
Section: Cluster Deposition and Growth Modelmentioning
confidence: 99%
“…It has been shown that PLD under vacuum conditions, even at room temperature, results in a higher island nucleation density with respect to molecular beam epitaxy (MBE), thus allowing atom-by-atom deposition of films with a controlled layer-by-layer morphology. [9][10][11][12] Moreover, it is known that laser ablation in the presence of an inert background gas results in a spatial confinement of the expanding plasma favoring cluster formation due to increased collision rate with the surrounding gas molecules [13][14][15] and thus allowing deposition of preformed clusters and growth of cluster-assembled materials. 16 In this framework, the comprehension of the parameters affecting plasma expansion dynamics and their role in regulating the deposition process is fundamental for the synthesis and deposition of clusters and for the growth of cluster-assembled films with tailored properties.…”
Section: Introductionmentioning
confidence: 99%
“…Pulse laser deposition (PLD) is a one method used to fabricate high-quality thin films that is advantageous in tuning the film characteristics [10]. However, there are a few reports on the fabrication of NiO thin film arrays using PLD [11][12][13]. In contrast, there is a wide range of investigations on high/low temperature oxidization of pure nickel.…”
Section: Introductionmentioning
confidence: 99%